Supercharge Your Innovation With Domain-Expert AI Agents!

Low-temperature deposition equipment provided with auxiliary positive pole

A technology of auxiliary anode and deposition equipment, applied in ion implantation plating, metal material coating process, coating and other directions, can solve the problems of substrate damage, substrate temperature rise, etc., to achieve low cost, low thermal effect, and great economy effect of benefit

Pending Publication Date: 2018-08-28
广东腾胜科技创新有限公司
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In the prior art, when the magnetron target is used to coat the substrate, the secondary electrons emitted by the plasma bombarding the target will bombard the substrate, and the energy carried by the secondary electrons w

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Low-temperature deposition equipment provided with auxiliary positive pole
  • Low-temperature deposition equipment provided with auxiliary positive pole

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] to combine figure 1 As shown, the low-temperature deposition equipment equipped with auxiliary anodes includes a vacuum chamber and flexible substrates placed in the vacuum chamber, unwinding rollers, first guide rollers, water-cooled drums, second guide rollers, winding rollers, and multiple pairs of magnetrons. target, multiple auxiliary anodes. The flexible base material goes around the unwinding roller, the first guide roller, the water cooling drum, the second guide roller and the winding roller in sequence; The running route of the flexible substrate is set in sequence. Multiple pairs of magnetron targets are arranged sequentially along the circumferential direction of the circumferential surface of the water-cooling drum, that is, each pair of magnetron targets is evenly arranged on an outer arc of the circumferential surface of the water-cooling drum. An auxiliary anode is arranged between each pair of magnetron targets, such as figure 1 As shown, two adjacen...

Embodiment 2

[0031] to combine figure 2 As shown, the low-temperature deposition equipment equipped with auxiliary anodes includes a vacuum chamber and a sheet substrate all arranged in the vacuum chamber, a conveying mechanism, multiple pairs of magnetron targets, and multiple auxiliary anodes. The sheet substrate is placed on the conveying mechanism, and the conveying mechanism conveys the sheet substrate. There are multiple pairs of magnetron targets above and below the sheet substrate. The multiple pairs of magnetron targets above the sheet substrate and the multiple pairs of magnetron targets below The magnetron targets are arranged sequentially along the conveying direction of the conveying mechanism, and an auxiliary anode is arranged between each pair of magnetron targets. Such as figure 2 As shown, two adjacent magnetron targets are called a pair of magnetron targets, and an auxiliary anode is arranged between the two magnetron targets. Each pair of magnetron target and auxili...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a low-temperature deposition equipment provided with an auxiliary positive pole. The low-temperature deposition equipment comprises a vacuum chamber, a flexible base material,an unreeling roll, a first guide rail, a water cooling drum, a second guide roll, a reeling roll, multiple pairs of magnetic control targets and a plurality of auxiliary positive poles, wherein all elements are arranged in the vacuum chamber; the unreeling roll, the first guide rail, the water cooling drum, the second guide roll, the reeling roll are wound by the flexible base material in sequence; multiple pairs of magnetic control targets are arranged in sequence in the peripheral direction of the peripheral surface of the water cooling drum; one auxiliary positive pole is arranged betweeneach pair of magnetic control targets; the first guide roll and the second guide roll are symmetrically arranged in the vacuum chamber; the unreeling roll and the reeling roll are symmetrically arranged in the vacuum chamber; the water cooling drum is arranged in the center of the vacuum chamber. The invention also relates to another low-temperature deposition equipment provided with the auxiliarypositive pole. According to the low-temperature deposition equipment, the base material can be protected from secondary electron bombardment, and the low-temperature deposition equipment belongs to the technical field of base material coating film.

Description

technical field [0001] The invention relates to the technical field of substrate coating, in particular to low-temperature deposition equipment equipped with auxiliary anodes. Background technique [0002] In the prior art, when the magnetron target is used to coat the substrate, the secondary electrons emitted by the plasma bombarding the target will bombard the substrate, and the energy carried by the secondary electrons will be transferred to the substrate. This causes the temperature of the substrate to rise. For some materials with high temperature sensitivity, the temperature rise caused by the secondary electrons will cause damage to the substrate. Contents of the invention [0003] Aiming at the technical problems existing in the prior art, the object of the present invention is to provide a low-temperature deposition equipment equipped with an auxiliary anode, which can avoid secondary electrons from bombarding the substrate. [0004] In order to achieve the abov...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C14/56C23C14/35
CPCC23C14/562C23C14/352
Inventor 朱刚毅朱刚劲朱文廓
Owner 广东腾胜科技创新有限公司
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com