Printing method of functional micro nano heterostructure

A printing method and heterostructure technology, which is applied in the printing field of functional micro-nano heterostructures, can solve the problems of chaotic connection methods of heterogeneous structures, difficulty in controlling solutions, etc., and achieve the effect of precise and controllable interface morphology

Active Publication Date: 2018-09-04

INST OF CHEM CHINESE ACAD OF SCI +1

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AI-Extracted Technical Summary

Problems solved by technology

However, one of the biggest difficulties in the preparation of micro-nanostructures by the solution method is that it is difficult to control the flow of the solution, ...

Abstract

The invention discloses a printing method of a functional micro nano heterostructure. The method comprises the following steps of: 1, uniformly spreading organic-phase nano material assembling liquidon the surface of a silicon pillar template, then covering a substrate on the silicon pillar template, and enabling a solvent in the organic-phase nano material assembling liquid to be volatilized, soas to form a point array structure which is regular in arrangement and formed by deposition of a nano material on the substrate; and 2, injecting water-phase nano material assembling liquid onto thesilicon pillar template, and enabling water in the water-phase nano material assembling liquid to be volatilized, so that the nano material is deposited on the substrate in a regular ordered line array structure, and finally, the point-line connection micro nano heterostructure is formed on the substrate. The printing method can implement large-area printing of the heterostructure on the substrate, so that the heterostructure has potential application value in the aspects of a micro nano electronic circuit, an optical element, biological detection and the like.

Application Domain

Decorative surface effectsChemical vapor deposition coating +1

Technology Topic

SolventMicro nano +3

Image

Examples

Experimental program(7)

Example Embodiment

[0038] Example 1

[0039] The mass content of CdS prepared from CdS quantum dots with a particle size of 5 nm, polystyrene and o-dichlorobenzene is 0.2%, the mass content of polystyrene is 0.1%, and the balance is the assembly solution of o-dichlorobenzene. Take 10 microliters from the liquid gun and spread it evenly on the circular silicon pillar template for photolithography; cover the silicon substrate on the silicon pillar template covered with the assembly solution, and let the solvent evaporate evenly at 80 °C; take out the device and place it at room temperature to cool down, and again Inject 10 μl of the assembly solution prepared from CdS quantum dots with a particle size of 5 nm, polyvinyl alcohol, sodium dodecyl sulfate and water, wherein the mass content of CdS is 0.2%, the mass content of polyvinyl alcohol is 0.5%, and the mass content of twelve The mass content of sodium alkyl sulfate is 0.2%, and the balance is water, so that the solvent is uniformly volatilized at 50 ° C. After the water in the assembly solution is volatilized, a silicon wafer with a flat surface is obtained. nano-connection structure.

Example Embodiment

[0040] Example 2

[0041] The mass content of CdS prepared from CdS quantum dots with a particle size of 5 nm, polystyrene and o-dichlorobenzene is 0.2%, the mass content of polystyrene is 0.5%, and the balance is o-dichlorobenzene. Take 10 microliters from the liquid gun and spread it evenly on the circular silicon pillar template for photolithography; cover the silicon substrate on the silicon pillar template covered with the assembly solution, and let the solvent evaporate evenly at 80 °C; take out the device and place it at room temperature to cool down, and again Inject 10 μl of the assembly solution prepared from CdS quantum dots with a particle size of 5 nm, polyvinyl alcohol, sodium dodecyl sulfate and water, wherein the mass content of CdS is 0.2%, the mass content of polyvinyl alcohol is 0.5%, and the mass content of twelve The mass content of sodium alkyl sulfate is 0.2%, and the balance is water, so that the solvent is uniformly volatilized at 50 ° C. After the water in the assembly solution is volatilized, a microstructure of wire-coated circular dots is obtained on a silicon wafer with a flat surface. nano-connection structure.

Example Embodiment

[0042] Example 3

[0043] The mass content of CdS prepared from CdS quantum dots with a particle size of 5 nm, polystyrene and o-dichlorobenzene is 0.2%, the mass content of polystyrene is 1%, and the balance is o-dichlorobenzene. Take 10 microliters from the liquid gun and spread it evenly on the circular silicon pillar template for photolithography; cover the silicon substrate on the silicon pillar template covered with the assembly solution, and let the solvent evaporate evenly at 80 °C; take out the device and place it at room temperature to cool down, and again Inject 10 μl of the assembly solution prepared from CdS quantum dots with a particle size of 5 nm, polyvinyl alcohol, sodium dodecyl sulfate and water, wherein the mass content of CdS is 0.2%, the mass content of polyvinyl alcohol is 0.5%, and the mass content of twelve The mass content of sodium alkyl sulfate is 0.2%, and the balance is water, so that the solvent is uniformly volatilized at 50 ° C. After the water in the assembly solution is volatilized, a micro-nano with lines connecting circular dots is obtained on a silicon wafer with a flat surface. connection structure.

PUM

Property	Measurement	Unit
Particle size	2.0 ~ 900.0	nm
Particle size	5.0	nm
Particle size	180.0	nm

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