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A Printing Method of Functional Micro-Nano Heterostructure

A printing method and heterostructure technology, which is applied in the printing field of functional micro-nano heterostructures, can solve the problems of chaotic connection methods of heterogeneous structures, difficulty in controlling solutions, etc., and achieve the effect of precise and controllable interface morphology

Active Publication Date: 2019-07-16
INST OF CHEM CHINESE ACAD OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, one of the biggest difficulties in the preparation of micro-nanostructures by the solution method is that it is difficult to control the flow of the solution, especially when the solution flows on the surface of the micro-nanostructures, it is easy to cause heterogeneous structures to form chaotic connections at the junctions.

Method used

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  • A Printing Method of Functional Micro-Nano Heterostructure
  • A Printing Method of Functional Micro-Nano Heterostructure
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Examples

Experimental program
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Effect test

Embodiment 1

[0039] The mass content of CdS prepared by CdS quantum dots with a particle size of 5nm, polystyrene and o-dichlorobenzene is 0.2%, the mass content of polystyrene is 0.1%, and the balance is o-dichlorobenzene. Take 10 microliters from the liquid gun and spread it evenly on the photolithographic circular silicon column template; cover the silicon substrate on the silicon column template covered with the assembly solution, and let the solvent evaporate evenly at 80°C; take out the device and let it cool at room temperature, and again Inject 10 microliters of the assembly solution prepared by CdS quantum dots with a particle size of 5nm, polyvinyl alcohol, sodium lauryl sulfate and water, wherein the mass content of CdS is 0.2%, and the mass content of polyvinyl alcohol is 0.5%. The mass content of sodium alkyl sulfate is 0.2%, and the balance is water, so that the solvent is uniformly volatilized at 50° C., and after the water in the assembly solution volatilizes, a silicon wafe...

Embodiment 2

[0041] The mass content of CdS prepared by CdS quantum dots with a particle size of 5nm, polystyrene and o-dichlorobenzene is 0.2%, the mass content of polystyrene is 0.5%, and the balance is o-dichlorobenzene. Take 10 microliters from the liquid gun and spread it evenly on the photolithographic circular silicon column template; cover the silicon substrate on the silicon column template covered with the assembly solution, and let the solvent evaporate evenly at 80°C; take out the device and let it cool at room temperature, and again Inject 10 microliters of the assembly solution prepared by CdS quantum dots with a particle size of 5nm, polyvinyl alcohol, sodium lauryl sulfate and water, wherein the mass content of CdS is 0.2%, and the mass content of polyvinyl alcohol is 0.5%. The mass content of sodium alkyl sulfate is 0.2%, and the balance is water, so that the solvent is uniformly volatilized at 50° C., and after the water in the assembly solution volatilizes, the silicon ch...

Embodiment 3

[0043] The mass content of CdS prepared by CdS quantum dots with a particle size of 5nm, polystyrene and o-dichlorobenzene is 0.2%, the mass content of polystyrene is 1%, and the balance is o-dichlorobenzene. Take 10 microliters from the liquid gun and spread it evenly on the photolithographic circular silicon column template; cover the silicon substrate on the silicon column template covered with the assembly solution, and let the solvent evaporate evenly at 80°C; take out the device and let it cool at room temperature, and again Inject 10 microliters of the assembly solution prepared by CdS quantum dots with a particle size of 5nm, polyvinyl alcohol, sodium lauryl sulfate and water, wherein the mass content of CdS is 0.2%, and the mass content of polyvinyl alcohol is 0.5%. The mass content of sodium alkyl sulfate is 0.2%, and the balance is water, so that the solvent is uniformly volatilized at 50°C, and after the water in the assembly solution is volatilized, a micro-nano st...

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Abstract

The invention discloses a printing method of a functional micro nano heterostructure. The method comprises the following steps of: 1, uniformly spreading organic-phase nano material assembling liquidon the surface of a silicon pillar template, then covering a substrate on the silicon pillar template, and enabling a solvent in the organic-phase nano material assembling liquid to be volatilized, soas to form a point array structure which is regular in arrangement and formed by deposition of a nano material on the substrate; and 2, injecting water-phase nano material assembling liquid onto thesilicon pillar template, and enabling water in the water-phase nano material assembling liquid to be volatilized, so that the nano material is deposited on the substrate in a regular ordered line array structure, and finally, the point-line connection micro nano heterostructure is formed on the substrate. The printing method can implement large-area printing of the heterostructure on the substrate, so that the heterostructure has potential application value in the aspects of a micro nano electronic circuit, an optical element, biological detection and the like.

Description

technical field [0001] The invention relates to a printing method of a functional micro-nano heterogeneous structure. Background technique [0002] Functional dot-line micro-nanostructures are the basic functional units that constitute many optical components, microelectronic circuits, and sensors, and have great potential application value in industrial applications. In particular, the dot-line micro-nano structure is connected in a lateral manner, which can reasonably combine the properties of the functional dot-line micro-nano structure, and provides physical characteristics that a single functional dot-line micro-nano structure does not have. In the connection of dot-line micro-nano structures, the connection mode of dot-line micro-nano units is particularly important. The novel interfaces appearing at the junctions of dot-line micro-nanostructures have attracted much attention in the study of heterostructures in recent years, providing many innovative functions for het...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B81C1/00
CPCB81C1/00031
Inventor 李一凡苏萌宋延林
Owner INST OF CHEM CHINESE ACAD OF SCI
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