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201 results about "Microelectronic circuits" patented technology

Tamper-resistant electronic circuit and module incorporating electrically conductive nano-structures

A device and method are disclosed comprising one or more electrically conductive nano-structures defined on one or more surfaces of a microelectronic circuit such as an integrated circuit die, microelectronic circuit package (such as a TSOP, BGA or other prepackaged IC) a stacked microelectronic circuit package, or on the surface of one or more layers in a stack of layers containing one or more ICs.In one embodiment, the electrically conductive nano-structure is in electrical connection with a monitoring circuit and acts as a “trip wire” to detect unauthorized tampering with the device or module. Such a monitoring circuit may include a power source such as an in-circuit or in-module battery and a “zeroization” circuit within the chip or package to erase the contents of a memory when the electrically conductive nano-structure is breached or altered. The device may be configured to blow one or more fuses or overcurrent protection devices when the electrically conductive nano-structure is breached or altered.In a further embodiment, one or more electrically conductive nano-structures are used to interconnect and reroute one or more electrical connections between one or more ICs (or dummy leads and vias) to create an “invisible” set of electrical connections on the chip or stack to obfuscate an attempt to reverse engineer the device, i.e., a set of connections that cannot be observed by standard test means such as by X-ray or conventional microscope.
Owner:PFG IP +1

Focus control system

A process for controlling focus parameters in a lithographic process used in manufacture of microelectronic circuits. The process comprises initially providing a lithographic mask having a target mask portion containing a measurable dimension sensitive to defocus, projecting an energy beam through the target mask portion onto a first location of a substrate at a first focus setting, and lithographically forming a first target on the substrate corresponding to the first focus setting, the first target containing a measurable dimension sensitive to defocus. The process then includes projecting an energy beam through the target mask portion onto a second location of the substrate at a second focus setting, lithographically forming a second target on the substrate corresponding to the second focus setting, the second target containing a measurable dimension sensitive to defocus, and measuring the defocus sensitive dimension for each of the first and second targets on the substrate. The defocus sensitive dimension of the first and second targets are then compared and there is determined a desired focus setting of the energy beam based on the comparison of the dimensions of the first and second target. The process may be used to form focus setting targets on a semiconductor wafer for use in manufacture of microelectronic circuits.
Owner:GLOBALFOUNDRIES INC
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