The application provides a manufacturing method of glass direct
copper clad circuit, relates to the technical field of microelectronic circuit manufacturing, and comprises the following steps: S01,
copper foil surface planarization: the
copper foil is adhered to a UV photosensitive
adhesive film, and the surface of the adhered
copper foil is ground; after the surface of the
copper foil is ground to reach a target roughness, the
copper foil is cleaned and dried; S02, laminated static pressure: a glass substrate, the UV photosensitive
adhesive film with the adhered copper foil and a carrier plate are sequentially laminated and fixed, vacuum is drawn and sealed, static pressure is applied to the formed sealed body, and a structure to be welded is obtained; and S03,
laser selective
welding: an
ultrashort pulse laser and a short pulse are combined, and multiple compound scans are performed by using an
energy gradient, so that the problem that an interface gap cannot be effectively reduced and the interface is easy to be ablated when a
laser is used for
welding to manufacture a glass copper clad circuit is solved, and the interface fusion capacity between the copper foil and the glass is improved.