Purifying device of fluorides in semiconductor processing process exhaust gas
A purification device and semiconductor technology, which is applied in the direction of gas treatment, chemical instruments and methods, and separation of dispersed particles, can solve the problems of not being environmentally friendly, and cannot purify fluoride thoroughly and efficiently, so as to save energy, save purification time, and purify thoroughly Effect
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[0023] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0024] like Figure 1-5As shown, the embodiment of the present invention provides a purification device for fluoride in semiconductor process waste gas, including a frame 1, the left end of the frame 1 is connected to a waste output port 2 through a waste gas pipe, and a flame reaction device is fixedly installed on the top of the frame 1 Chamber 3, the bottom end of the inner wall of the flame reaction chamber 3 is fixedly equipped with a hollow pipe 4, and t...
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