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Purifying device of fluorides in semiconductor processing process exhaust gas

A purification device and semiconductor technology, which is applied in the direction of gas treatment, chemical instruments and methods, and separation of dispersed particles, can solve the problems of not being environmentally friendly, and cannot purify fluoride thoroughly and efficiently, so as to save energy, save purification time, and purify thoroughly Effect

Pending Publication Date: 2018-10-09
安徽京仪自动化装备技术有限公司
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0004] Aiming at the deficiencies of the prior art, the present invention provides a purification device for fluoride in semiconductor process waste gas, which solves the problems that the fluoride purification device cannot completely and efficiently purify fluoride and is not environmentally friendly

Method used

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  • Purifying device of fluorides in semiconductor processing process exhaust gas
  • Purifying device of fluorides in semiconductor processing process exhaust gas
  • Purifying device of fluorides in semiconductor processing process exhaust gas

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Embodiment Construction

[0023] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0024] like Figure 1-5As shown, the embodiment of the present invention provides a purification device for fluoride in semiconductor process waste gas, including a frame 1, the left end of the frame 1 is connected to a waste output port 2 through a waste gas pipe, and a flame reaction device is fixedly installed on the top of the frame 1 Chamber 3, the bottom end of the inner wall of the flame reaction chamber 3 is fixedly equipped with a hollow pipe 4, and t...

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Abstract

The invention provides a purifying device of fluorides in semiconductor processing process exhaust gas, and belongs to the technical field of purifying device. The purifying device comprises a machineframe; the left end of the machine frame is communicated with a waste outlet terminal through an exhaust gas pipe; the top of the machine frame is fixedly provided with a flame reaction chamber; a hollow tube is fixedly arranged on the internal wall bottom of the flame reaction chamber; a combustion gas reaction device is fixedly arranged on the top of the hollow tube; the combustion gas reactiondevice comprises a combustion gas reaction tank; the flame reaction chamber is communicated with a combustion gas output terminal through a gas inlet; a flame nozzle is fixedly arranged on the external surface of the combustion gas reaction tank. The purifying device of fluorides in semiconductor processing process exhaust gas is capable of removing fluorides in exhaust gas completely; efficiencyis higher; purifying time is shortened; in addition, heat energy circulation is adopted to save energy, the purifying device is more friendly to the environment; high reaction is combined with waterreaction; reaction time is shortened; and energy is saved.

Description

technical field [0001] The invention relates to the technical field of purification devices, in particular to a purification device for fluoride in semiconductor process waste gas. Background technique [0002] Semiconductor is a common carrier of electronic components. With the development of society, electronic products are becoming more and more diversified, and the application of semiconductors is becoming more and more common, and the process of preparing semiconductors is becoming more and more familiar to people. [0003] There will be a lot of harmful gases in the process of semiconductor preparation. The direct discharge of these gases will endanger the environment and human health, especially the harm of fluoride is the most serious, so there is a device for purifying fluoride. The traditional purification device is the first After the preliminary water washing process, then the high temperature process, and finally the water washing process, the final water washin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/75B01D53/76B01D53/82B01D53/68
CPCB01D53/68B01D53/685B01D53/75B01D53/76B01D53/82B01D2257/2047
Inventor 曹小康杨春水杨春涛宁腾飞赵力行邹昭平蒋俊海于浩
Owner 安徽京仪自动化装备技术有限公司