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Graphene oxide/carbon nitride/bismuth oxyiodide composite material, and preparation method and applications thereof

A technology of bismuth iodide and composite materials, which is applied in chemical instruments and methods, botanical equipment and methods, applications, etc., can solve the problems of low antibacterial effect, limited application of bismuth iodide monomer, and high recombination rate, and achieves the preparation method. Simple and easy, high application prospect and practical value, the effect of low product cost

Active Publication Date: 2018-10-23
JIANGSU UNIV
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

However, due to the high recombination rate of photogenerated electron-hole pairs, the application of bismuth oxyiodide monomer is limited to a certain extent.
[0003] Combining with semiconductor material carbon nitride is an effective way to improve the photocatalytic activity of bismuth ox

Method used

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  • Graphene oxide/carbon nitride/bismuth oxyiodide composite material, and preparation method and applications thereof
  • Graphene oxide/carbon nitride/bismuth oxyiodide composite material, and preparation method and applications thereof
  • Graphene oxide/carbon nitride/bismuth oxyiodide composite material, and preparation method and applications thereof

Examples

Experimental program
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Example Embodiment

[0025] Preparation of bismuth iodide oxide (BiOI): weigh 0.332g of potassium iodide and dissolve in 40mL of distilled water to prepare potassium iodide solution; weigh 0.97g of bismuth nitrate pentahydrate and dissolve in 30mL of ethylene glycol to prepare bismuth nitrate pentahydrate in ethylene glycol solution; The potassium iodide solution was dropped into the bismuth nitrate pentahydrate ethylene glycol solution, stirred at room temperature for 60 minutes, washed with water, and the resulting precipitate was dried in an oven at 60° C., and ground, as the reference BiOI.

[0026] Carbon nitride (g-C 3 N 4 ) Preparation: Weigh 4.0g urea, calcinate in a muffle furnace at 520℃ for 4h, cool and grind to obtain g-C 3 N 4 .

[0027] Carbon nitride / bismuth iodide (g-C 3 N 4 / BiOI) Preparation: Weigh 0.332g of potassium iodide and dissolve it in 40mL of distilled water, add 0.176g of g-C 3 N 4 , Disperse it by ultrasound (denoted as solution A); weigh out 0.97g of bismuth nitrate pentahy...

Example Embodiment

[0028] Example 1:

[0029] g-C 3 N 4 Preparation: Weigh 4.0g of urea, calcined in a muffle furnace at 550℃ for 3h, cool and grind to obtain g-C 3 N 4 .

[0030] GO / g-C 3 N 4 / BiOI preparation: Weigh 0.332g of potassium iodide and dissolve it in 41mL of distilled water, add 0.47mL of graphene oxide (GO) solution (1mg / mL) and 0.235g of g-C to it 3 N 4 Disperse it by ultrasound to prepare a suspension solution; weigh out 0.97g of bismuth nitrate pentahydrate and dissolve it in 38.8mL ethylene glycol solution to prepare a ethylene glycol solution of bismuth nitrate pentahydrate; drop the suspension solution into nitric acid pentahydrate In the bismuth glycol solution, stirred at room temperature for 90 minutes, the resulting precipitate was washed with water, dried in an oven at 60°C, and ground to obtain a graphene oxide / carbon nitride / iodine bismuth oxide composite material, including graphene oxide, carbon nitride, and iodine The mass percentages of bismuth oxide are 0.05%, 25%, and...

Example Embodiment

[0032] Example 2:

[0033] g-C 3 N 4 Preparation: Weigh 4.0g of urea, calcinate in a muffle furnace at 520℃ for 5h, cool and grind to obtain g-C 3 N 4 .

[0034] GO / g-C 3 N 4 / BiOI preparation: Weigh 0.332g potassium iodide and dissolve in 22.7mL distilled water, add 7.49mL GO solution (1mg / mL) and 0.037g g-C to it 3 N 4 Disperse it by ultrasound to prepare a suspension solution; weigh 0.97g of bismuth nitrate pentahydrate and dissolve it in 24.3 mL of ethylene glycol solution to prepare a ethylene glycol solution of bismuth nitrate pentahydrate; drop the suspension solution into nitric acid pentahydrate In the bismuth glycol solution, stirred at room temperature for 60 minutes, the resulting precipitate was washed with water, dried in an oven at 90°C, and ground to obtain a graphene oxide / carbon nitride / iodine bismuth oxide composite material, including graphene oxide, carbon nitride, and iodine The mass percentage of bismuth oxide is 1%, 5%, and 94%.

[0035] GO / g-C obtained in th...

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Abstract

The invention belongs to the field of nano composite material preparation and application, and relates to a graphene oxide/carbon nitride/bismuth oxyiodide (GO/g-C3N4/BiOI) composite material, and a preparation method and applications thereof. Through in-situ compounding graphene oxide, carbon nitride, and bismuth oxyiodide, a heterojunction structure is formed among graphene oxide, carbon nitride, and bismuth oxyiodide; the chance of compounding between photo-induced electrons and cavities of the composite material is reduced effectively, the preparation method is simple and easy to perform;the cost is low, the preparation method is easy for industrial production and has a high application value and wide application prospect; and the composite material can effectively kill escherichia coli, staphylococcus aureus, and candida albicans in the presence of visible light, and can be used in the field of visible light catalyzed sterilization.

Description

Technical field [0001] The invention belongs to the field of nano composite material preparation and application, and specifically relates to a graphene oxide / carbon nitride / bismuth iodide oxide (GO / g-C 3 N 4 / BiOI) composite materials and their preparation methods and applications. Background technique [0002] In recent years, bacteria and viruses have posed a huge threat to human health. Common sterilization methods include radiation sterilization, dry heat sterilization, moist heat sterilization, filter sterilization, and chemical reagent sterilization. Heat sterilization, moist heat sterilization, and filtration sterilization all require the use of specific instruments and equipment, and the conditions are harsh; chemical reagent sterilization often uses reagents such as formaldehyde, ethylene oxide, peracetic acid, and silver ions, but these reagents Both the human body and the environment have certain side effects. Photocatalytic technology is based on semiconductor mater...

Claims

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Application Information

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IPC IPC(8): B01J27/24A01N59/12A01N59/00A01P3/00A01P1/00
CPCA01N59/00A01N59/12B01J27/24B01J35/004
Inventor 李夜平王倩盛丹玫黄立英杨娟程晓农
Owner JIANGSU UNIV
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