Substrate cleaning device, developing machine and substrate cleaning method

A technology for cleaning devices and developing machines, applied in cleaning methods and tools, cleaning methods using liquids, chemical instruments and methods, etc., can solve problems such as uneven color, water residue, uneven water film, etc., to improve yield, The effect of reducing poor quality, increasing the fluidity of the water film and the uniformity of the thickness of the water film

Inactive Publication Date: 2018-11-13
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the above method and structure are prone to uneven water film, water residue, uneven color and other poor quality problems

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Substrate cleaning device, developing machine and substrate cleaning method
  • Substrate cleaning device, developing machine and substrate cleaning method
  • Substrate cleaning device, developing machine and substrate cleaning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0013] This application provides a substrate cleaning device, a developing machine, and a substrate cleaning method. In order to make the purpose, technical solution, and technical effect of this application clearer and clearer, the application will be further described in detail below. It should be understood that the specific implementation regulations described here are only It is used to explain the application, not to limit the application.

[0014] refer to figure 1 , figure 1 It is a structural schematic diagram of an embodiment of the substrate cleaning device of the present application. The substrate cleaning device includes an output pipeline 11 of cleaning liquid, and a plurality of liquid outlet nozzles 12 are arranged on the side of the output pipeline 11 opposite to the substrate 14 to be cleaned. In this embodiment, the output The number of pipes 11 is one. In other embodiments, multiple pipes can also be set according to actual needs. The number of liquid nozz...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a substrate cleaning device, a developing machine and a substrate cleaning method. The substrate cleaning device comprises an output pipeline of the cleaning liquid, and a plurality of liquid outlet nozzles are arranged on one side, opposite to the substrate to be cleaned, of the output pipeline, the substrate cleaning device further comprises a driving device, the drivingdevice is connected with the output pipeline and used for driving the output pipeline to move in the set direction according to the set frequency. According to substrate cleaning device, the fluidityof the water film on the surface of the glass substrate and the thickness uniformity of the water film are improved, so that poor quality caused by nonuniform water films can be reduced.

Description

technical field [0001] The present application relates to the field of display technology, in particular to a substrate cleaning device, a developing machine and a substrate cleaning method for cleaning a substrate. Background technique [0002] In the production process of the color filter substrate, the glass substrate needs to be cleaned first, and then the photoresist material is applied to the substrate, and most of the solvent is removed by a drying system, and pre-baking, exposure, development and post-baking are performed. And other crafts. [0003] At present, the cleaning of the glass substrate is mainly to remove the dust particles, foreign matter and organic matter on the glass substrate, which is mainly realized by structures such as rollers and sprayers. Specifically, during the cleaning process of the glass substrate, it is conveyed forward by the rollers of the glass substrate cleaning device, and at the same time, water or liquid medicine, lotion, etc. are ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B08B11/04B08B3/02B08B13/00
CPCB08B3/022B08B11/04B08B13/00
Inventor 徐毕龙
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap