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Spray plating device and control method thereof

A control method and equipment technology, which is applied in the field of spraying, can solve the problems of glass contamination, equipment dust cannot be quickly and quickly discharged from equipment, and low product yield, so as to improve yield, avoid contamination of glass substrates, and reduce production costs. Effect

Inactive Publication Date: 2018-11-23
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the problem with related technologies is that the spraying chamber is usually designed with a fully sealed partition, so that the dust in the equipment cannot be quickly and quickly discharged from the equipment, but stays in the equipment and contaminates the glass, resulting in a low yield rate of products produced by the equipment.

Method used

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  • Spray plating device and control method thereof
  • Spray plating device and control method thereof
  • Spray plating device and control method thereof

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Embodiment Construction

[0028] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0029] The sputtering equipment and the control method of the sputtering equipment according to the embodiments of the present invention will be described below with reference to the accompanying drawings.

[0030] figure 1 is a schematic block diagram of a sputtering device according to an embodiment of the present invention. Such as figure 1 As shown, the spraying equipment of the embodiment of the present invention includes: a spraying chamber 10 , a fan 20 , an air outlet 30 , a detection device 40 and a control device 50 ....

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Abstract

The invention discloses a spray plating device and a control method thereof. The device comprises a spray plating chamber, a fan disposed on the top of the spray plating chamber, wherein the fan is used for blowing air into the spray plating chamber, an air outlet disposed on the bottom of the spray plating chamber, wherein the air outlet area of the air outlet is adjustable, a detecting device for detecting the change in the air flow in the spray plating chamber, and a control device, wherein the control device is connected to the detecting device and used for judging whether the air flow inthe spray plating room is abnormal according to the change in the air flow in the spray plating chamber and adjusting the air outlet area when abnormal air flow occurs in the spray plating chamber toeffectively discharge the dust in the spray plating chamber, and solve the airflow problem inside the device and quickly discharge the dust in the device through airflow, thereby avoiding dust trapping in the device and contaminating glass substrate, so thatimproving the good rate of the device is improved and reducing the production cost is reduced.

Description

technical field [0001] The invention relates to the technical field of spraying, in particular to a spraying equipment and a control method for the spraying equipment. Background technique [0002] The sputtering equipment is one of the most important equipment in the Array stage of the TFT-LCD (Thin Film Transistor-Liquid Crystal Display) field, and the yield of the sputtering equipment is crucial to the yield of the entire TFT substrate. However, the problem with related technologies is that the spraying chamber is usually designed with fully sealed partitions, so that the fine dust in the equipment cannot be quickly and quickly discharged from the equipment, but stays in the equipment and contaminates the glass, resulting in a low yield rate of products produced by the equipment. Contents of the invention [0003] The present invention aims to solve one of the technical problems in the related art at least to a certain extent. Therefore, an object of the present invent...

Claims

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Application Information

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IPC IPC(8): C03C17/00
CPCC03C17/002
Inventor 李兵杨海军尹盛焕
Owner BOE TECH GRP CO LTD
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