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A kind of array substrate and its preparation method, display

A technology for array substrates and displays, which is applied in the manufacture of semiconductor devices, electric solid state devices, and semiconductor/solid state devices, etc., can solve the problems of high cost and large number of masks, and can reduce the number of use, production costs, and masks. The effect of the steps of the process

Active Publication Date: 2021-01-26
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The present invention mainly provides an array substrate, its preparation method, and a display, aiming at solving the problem that the number of photomasks used in the film formation process of the array substrate is large and the cost is high

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  • A kind of array substrate and its preparation method, display
  • A kind of array substrate and its preparation method, display
  • A kind of array substrate and its preparation method, display

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Embodiment Construction

[0026] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0027] see figure 1 , figure 1 This is a schematic flowchart of an embodiment of a method for preparing an array substrate provided by the present invention. The method in this embodiment may specifically include:

[0028] S11: forming a polysilicon layer on the base substrate through a first mask process;

[0029] see figure 2 , figure 2 Yes figure 1 Schematic diagram of the structure of the array substrate formed in step S11, wherein, pla...

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Abstract

The invention provides an array substrate, a preparation method of the same, and a display. The preparation method of the array substrate enables a pixel electrode layer, a gate pattern layer and a doped polysilicon layer to be formed by a mask process, thus, reducing the steps of the mask process, compared to the prior art in which the three-layer structure of the pixel electrode layer, the gatepattern layer and the doped polysilicon layer requires at least three mask processes, so as to reduce the number of masks used, reduce the production cost, and save the production time.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to an array substrate, a preparation method thereof, and a display. Background technique [0002] Low temperature poly-silicon (LTPS for short), due to its high electron mobility, can effectively reduce the area of ​​the TFT device, thereby increasing the aperture ratio of the pixel. While increasing the display brightness of the panel, the overall power consumption can be reduced, so that the manufacturing cost of the panel can be greatly reduced, and it has become a hot technology in the field of liquid crystal display. [0003] However, the LTPS process is complex, and the array substrate array has many layers of film, generally requiring 10 or even more layer-level structures, resulting in the use of a large number of masks, which increases the amount of light. costs, material and operating costs, and result in longer production times. SUMMARY OF THE INVENTION [00...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/12H01L21/77
CPCH01L27/1214H01L27/1288
Inventor 张鑫肖军城田超
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD