Super-liquid-repellent coating film and curable composition for forming super-liquid-repellent coating film
A composition and curing technology, applied in other chemical processes, chemical instruments and methods, coatings, etc., can solve problems such as insufficient wear resistance, and achieve excellent liquid repellency and wear resistance
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Embodiment 1
[0217] Embodiment 1 [Rf (C6) methacrylate / microparticle] the making of copolymer / TAHFNHA=60 / 40 (w / w) film
[0218] [Preparation of [[Rf(C6)methacrylate / microparticle] copolymer solution]
[0219] Fill C in the test tube with branch 6 f 13 CH 2 CH 2 OCOC (CH 3 )=CH 2 [Hereinafter, it may be abbreviated as Rf (C6) methacrylate] 25.46 g, 12.70 g of silica microparticles having a radical reactive group on the surface and an average primary particle diameter of 12 nm, and 663.49 g of perfluorobutyl ether , purged with nitrogen, and heated to 70°C. 1.26516 g of AIBN was put into it, and it was reacted for 6 hours. After polymerization, the solid content concentration was calculated.
[0220] (Preparation of photosensitive solution)
[0221] 0.3256 g of triacryloylheptadecafluorononenyl pentaerythritol (hereinafter, sometimes abbreviated as TAHFNHA), 0.0413 g of alkylphenone-based photopolymerization initiator, 1.0949 g of IPA, and 7.4783 g of perfluorobutyl ethyl ether we...
Embodiment 2
[0224] Embodiment 2 [Rf (C6) methacrylate / microparticle] the making of copolymer / TAHFNHA=50 / 50 (w / w) film
[0225] Except that 0.4157g of TAHFNHA, 0.0404g of alkylphenone-based photopolymerization initiator, 1.0675g of IPA, 9.5001g of perfluorobutyl ether, and 9.6917g of copolymer solution in the item (preparation of photosensitive solution) , Prepared by the same method as in Example 1. The fluorine atom content of the produced film was 42.3 wt % with respect to the constituent components of the entire film.
Embodiment 3
[0226] Embodiment 3 [Rf (C6) methacrylate / microparticle] the making of copolymer / TAHFNHA=40 / 60 (w / w) film
[0227] Except that 0.4817g of TAHFNHA, 0.0402g of alkyl phenone-based photopolymerization initiator, 1.1468g of IPA, 11.5713g of perfluorobutyl ether, and 8.0478g of copolymer solution in the item (preparation of photosensitive solution) , Prepared by the same method as in Example 1. The fluorine atom content of the produced film was 43.3 wt % with respect to the constituent components of the entire film.
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