A kind of preparation method of antifouling, sterilizing and renewable long-acting antibacterial mixed polymer brush
A mixed polymer, long-acting technology, applied in botany equipment and methods, biocides, plant growth regulators, etc., can solve problems such as irritation, accumulation of dead bacteria, and shortened service life of antibacterial surfaces
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Embodiment 1
[0051] Take a silicon wafer with a size of 1cm*2cm and place it in freshly prepared concentrated H 2 SO 4 、H 2 o 2 In a solution with a volume ratio of 3:1, react in an oil bath at 120° C. for 30 minutes to obtain a hydroxylated silicon wafer surface. Dip the pretreated silicon wafer into ATRP initiator 3-(2-bromoisobutanolamino)propyl(trimethoxy)silane and PIMP initiator (4-trimethylsiloxane)-phenyl-N , In the chloroform solution of allyl N-diethyldithiocarbamate, the ratio of the two initiators is 1:1, and the reaction is carried out at room temperature for 12 hours. Chloroform, ethanol, and deionized water were ultrasonically cleaned in sequence to obtain a silicon wafer on the grafted surface of the mixed initiator.
[0052] The silicon substrate after the above treatment was placed in a reaction test tube, and 0.30g DVBAPS, 1.25mL TFE, 1.2mL deionized water, 6.5μL Me 6 TREN, 10mg CuBr, after several times of vacuum pumping-through N 2 After the cycle, the system was...
Embodiment 2
[0058] Take a silicon wafer with a size of 1cm*2cm and place it in freshly prepared concentrated H 2 SO 4 、H 2 o 2 In a solution with a volume ratio of 3:1, react in an oil bath at 120° C. for 30 minutes to obtain a hydroxylated silicon wafer surface. Dip the pretreated silicon wafer into ATRP initiator 3-(2-bromoisobutanolamino)propyl(trimethoxy)silane and PIMP initiator (4-trimethylsiloxane)-phenyl-N , In the chloroform solution of allyl N-diethyldithiocarbamate, the ratio of the two initiators is 1:1, and the reaction is carried out at room temperature for 12 hours. Chloroform, ethanol, and deionized water were ultrasonically cleaned in sequence to obtain a silicon wafer on the grafted surface of the mixed initiator.
[0059] The silicon substrate after the above treatment was placed in a reaction test tube, and 0.50 g of SVBP, 1.8 mL of TFE, 1 mL of deionized water, and 6.2 μL of Me 6 TREN, 8mg CuCl, after several vacuum pumping-through N 2 After the cycle, the syste...
Embodiment 3
[0064] Take a silicon wafer with a size of 1cm*2cm and place it in freshly prepared concentrated H 2 SO 4 、H 2 o 2 In a solution with a volume ratio of 3:1, react in an oil bath at 120° C. for 30 minutes to obtain a hydroxylated silicon wafer surface. Dip the pretreated silicon wafer into ATRP initiator 3-(2-bromoisobutanolamino)propyl(trimethoxy)silane and PIMP initiator (4-trimethylsiloxane)-phenyl-N , In the chloroform solution of allyl N-diethyldithiocarbamate, the ratio of the two initiators is 1:1, and the reaction is carried out at room temperature for 12 hours. Chloroform, ethanol, and deionized water were ultrasonically cleaned in sequence to obtain a silicon wafer on the grafted surface of the mixed initiator.
[0065] The silicon substrate after the above treatment was placed in a reaction test tube, and 0.50g VBIPS, 1.34mL TFE, 2.5mL deionized water, 9mg CuBr, 5.8μL Me 6 TREN, after multiple vacuum pumping - through N 2 After the cycle, the system was reacted...
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