Fixed-point ion implantation device and implantation method for a substrate

Abstract

The invention discloses a fixed-point ion implantation device and an implantation method of a substrate, The apparatus comprises a control unit, a vacuum chamber, a substrate position device and a machine vision system, The substrate position device includes a substrate hold, a mask plate, a first X-axis moving mechanism, second X-axis moving mechanism, a first Y-axis moving mechanism and a secondY-axis moving mechanism, A substrate seat is arranged on the first X-axis moving mechanism, The mask plate is arranged on the second X-axis moving mechanism, a beam perforation is arranged on the mask plate, a machine vision system is used for detect the injection point position and the beam perforation center position on the substrate, and the mask plate is movable so as to align the central position of the beam perforation with the injection point position on the substrate. A method comprise vacuuming a vacuum chamber; measuring the position of the injection point on the substrate by movingthe substrate holder; moving the mask plate to measure the central position of the beam perforation, and moving the mask plate to align the central position of the beam perforation with the positionof the injection point; synchronously moving the substrate holder and the mask plate below the ion beam injection port; starting ion beams.

Description

technical field

[0001] The invention relates to the technical field of semiconductor equipment, in particular to a substrate fixed-point ion implantation device and an implantation method. Background technique

[0002] Ion implanter is one of the key equipment in semiconductor process. In the traditional implanter system, the general requirements are: the ion source system draws out the ion beam, and the ion beam is corrected and accelerated by the electromagnet, and finally reaches the substrate. The scanning device equipped with the equipment makes the entire substrate obtain the same uniformity. ion implantation dose.

[0003] In recent years, with the continuous development of the ion implantation process, there are some special requirements for ion implantation equipment in some fields, such as the need to achieve precise fixed-point implantation on a specific point on the substrate instead of the traditional whole-chip ion implantation. However, the existing In the t...

Examples

Embodiment 1

[0033] Such as Figure 1 to Figure 4 As shown, the fixed-point ion implantation device of the substrate of the present embodiment includes a control unit, a vacuum chamber 1, a substrate positioning device arranged in the vacuum chamber 1 and a machine vision system 2 arranged outside the vacuum chamber 1, The substrate positioning device includes a substrate holder 3, a cover plate 4, a first X-axis moving mechanism 5, a second X-axis moving mechanism 6, a first Y-axis moving mechanism 7, and a second Y-axis moving mechanism 8. The first X-axis The moving mechanism 5 is arranged on the first Y-axis moving mechanism 7, the second X-axis moving mechanism 6 is arranged on the second Y-axis moving mechanism 8, the substrate holder 3 is arranged on the first X-axis moving mechanism 5, and the cover plate 4 Set on the second X-axis moving mechanism 6, the substrate 9 is fixed on the substrate holder 3, the mask plate 4 is provided with a beam flow hole 41, and the machine vision sy...

technical field

[0001] The invention relates to the technical field of semiconductor equipment, in particular to a substrate fixed-point ion implantation device and an implantation method. Background technique

[0002] Ion implanter is one of the key equipment in semiconductor process. In the traditional implanter system, the general requirements are: the ion source system draws out the ion beam, and the ion beam is corrected and accelerated by the electromagnet, and finally reaches the substrate. The scanning device equipped with the equipment makes the entire substrate obtain the same uniformity. ion implantation dose.

[0003] In recent years, with the continuous development of the ion implantation process, there are some special requirements for ion implantation equipment in some fields, such as the need to achieve precise fixed-point implantation on a specific point on the substrate instead of the traditional whole-chip ion implantation. However, the existing In the t...

Examples

Embodiment 1

[0033] Such as Figure 1 to Figure 4 As shown, the fixed-point ion implantation device of the substrate of the present embodiment includes a control unit, a vacuum chamber 1, a substrate positioning device arranged in the vacuum chamber 1 and a machine vision system 2 arranged outside the vacuum chamber 1, The substrate positioning device includes a substrate holder 3, a cover plate 4, a first X-axis moving mechanism 5, a second X-axis moving mechanism 6, a first Y-axis moving mechanism 7, and a second Y-axis moving mechanism 8. The first X-axis The moving mechanism 5 is arranged on the first Y-axis moving mechanism 7, the second X-axis moving mechanism 6 is arranged on the second Y-axis moving mechanism 8, the substrate holder 3 is arranged on the first X-axis moving mechanism 5, and the cover plate 4 Set on the second X-axis moving mechanism 6, the substrate 9 is fixed on the substrate holder 3, the mask plate 4 is provided with a beam flow hole 41, and the machine vision sy...

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