Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Substrate dust-removal device for processing diffusion diaphragm

A dedusting device and sheet processing technology, applied in the direction of dust removal, cleaning methods and utensils, cleaning methods using gas flow, etc., can solve problems affecting product performance, uneven coating coating, etc., to reduce wear and protect substrates , to ensure the effect of dust removal effect

Inactive Publication Date: 2019-02-15
广州市高浦特光电科技有限公司
View PDF8 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the actual coating process, the surface of the coated substrate is often inevitably adhered to fine dust, suspended particles and other sticky dust. If the dust adhering to the surface of the substrate is not cleaned before coating Sticky dust will lead to uneven coating and affect the performance of the product

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Substrate dust-removal device for processing diffusion diaphragm
  • Substrate dust-removal device for processing diffusion diaphragm

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0013] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0014] see Figure 1~2 , in an embodiment of the present invention, a base material dedusting device for diffusion film processing, comprising an unwinding stand 1, a material roll 2, a base material 3, a guide roll 4, a static eliminator 5, a traction roll 6, a traction motor 7, Dust suction cover 8, air filter 9, air extraction pipe 10, centrifugal fan 11, blowing frame 12, nozzle fixing frame 13, branch air pipe 14, main air pipe 15 and high-frequency elect...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a substrate dust-removal device for processing a diffusion diaphragm. The substrate dust-removal device comprises an unwinding frame, a material reel, a substrate, a guiding roller, an electrostatic eliminator, traction rollers, a traction motor, a suction hood, an air filter, an exhaust pipe, a centrifugal fan, an injection frame, a spraying head fixing frame, a branch airpipe, a total air pipe and high-frequency solenoid valves. Through unwinding of the unwinding frame and cooperation of the guiding roller and the traction rollers, the substrate moves horizontally onthe top face of the dust-removal device at the constant speed, passes through the electrostatic eliminator firstly from right to left for electrostatic eliminating, and then enters the upper part ofthe suction hood, a controller controls the high-frequency solenoid valves to sequentially be closed and opened, thus high-frequency pulse airflow is formed to impact the surface of the substrate, dust is disengaged from the surface of the substrate, dust-containing gas is sucked by the suction hood, filtered by the air filter and then is discharged to the indoor space, in the whole process, the traction rollers and the guiding roller do not make contact with the surface of the substrate, abrasion of dust particles on the surface of the substrate is reduced, and the substrate is protected.

Description

technical field [0001] The invention relates to the technical field of optical film production, in particular to a base material dust removal device for diffusion film processing. Background technique [0002] The optical film printing production method is used in the backlight module of the display screen. It is a precision part. The substrate needs to be processed before processing. The function of the coating machine is to coat the rolled substrate plastic film with a layer of glue and paint with specific functions. Or ink and other coatings, and the base material is dried and rolled. However, in the actual coating process, the surface of the coated substrate is often inevitably adhered to fine dust, suspended particles and other sticky dust. If the dust adhering to the surface of the substrate is not cleaned before coating Sticky dust will lead to uneven coating and affect the performance of the product. During the coating process, the dust adhering to the substrate no...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B08B5/02B08B15/02H05F3/00
CPCB08B5/023B08B15/02H05F3/00
Inventor 吕奎
Owner 广州市高浦特光电科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products