Method of processing wafer
A processing method and wafer technology, applied in metal processing, stone processing equipment, metal processing equipment, etc., can solve problems such as poor productivity and time-consuming, and achieve the effect of a simple alignment process
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[0030] Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. refer to figure 1 , shows a front perspective view of a semiconductor wafer (hereinafter, sometimes simply referred to as a wafer) 11 suitable for processing by the processing method of the present invention.
[0031] On the front surface 11 a of the semiconductor wafer 11 , a plurality of dividing lines (streets) 13 are formed in a grid pattern. Devices 15 such as ICs and LSIs are formed in each region partitioned by vertical dividing lines 13 .
[0032] There are a plurality of electrode bumps (hereinafter, sometimes simply referred to as bumps) 17 on the front surface of each device 15, and the wafer 11 has on its front surface: a device region 19, which is formed with a plurality of devices each having a plurality of bumps 17 15 ; and a peripheral remaining region 21 surrounding the device region 19 .
[0033] In the wafer processing method according to t...
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