Mask plate and making method thereof

A manufacturing method and mask technology, applied in the field of mask, can solve the problems of high scrap rate and low precision, and achieve the effects of reducing scrap rate, improving precision and saving process.

Pending Publication Date: 2019-03-19
深圳市龙图光电有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] This application provides a mask and its manufacturing method, which solves the problems of

Method used

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  • Mask plate and making method thereof
  • Mask plate and making method thereof
  • Mask plate and making method thereof

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0021] Example one:

[0022] This embodiment provides a mask, specifically a variable optical transmittance mask.

[0023] Please refer to figure 1 , figure 2 with image 3 The mask includes a substrate 1 and a light-blocking layer 2; the light-blocking layer 2 is laid on the substrate 1; the light-blocking layer 2 is arranged with a plurality of light-transmitting through holes 3, and the light-transmitting through holes 3 are perpendicular to the light-blocking layer. The direction of 2 penetrates the light blocking layer 2, and the aperture a of the light-transmitting through hole 3 is: 0.8um≤a≤4um.

[0024] Specifically, within the value range of the aperture of the light-transmitting through hole 3, the aperture of the light-transmitting through hole 3 is proportional to the optical transmittance of the light blocking layer 2.

[0025] The aperture of the light-transmitting through hole 3 is smaller than the minimum resolution of the aligned exposure system. During exposure, the...

Example Embodiment

[0037] Embodiment two:

[0038] This embodiment provides a method for manufacturing a mask plate, which is used for manufacturing the mask plate in the first embodiment.

[0039] Please refer to Figure 8 , In an embodiment, the manufacturing method of the mask includes:

[0040] Light-transmitting through-hole setting step S1: selecting the shape, aperture and arrangement density of the light-transmitting through-holes according to the transmittance of the mask to be produced, and arranging the selected light-transmitting through-holes on a two-dimensional plane to form light-transmitting In the hole arrangement area, the aperture of the light-transmitting through holes is proportional to the optical transmittance of the light-blocking layer, and the arrangement density of the light-transmitting holes is directly proportional to the optical transmittance of the light-blocking layer;

[0041] Graphic fitting step S2: Project the two-dimensional contour map of the product onto the lig...

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Abstract

The invention discloses a mask plate and a making method thereof. The mask plate comprises a substrate and a light stopping layer; the light stopping layer is laid on the substrate; and a plurality oflight-transmitting through holes are arranged on the light stopping layer, the light-transmitting through holes penetrate through the light stopping layer in a direction which is perpendicular to thelight stopping layer, and the aperture a of each light-transmitting through hole is greater than or equal to 0.8 mu m and less than or equal to 4 mu m. The aperture of each light-transmitting throughhole is smaller than the minimum resolution of an aligned exposure system, during explosion, light which penetrates through the through holes does not illuminate to the raw material of the product ina direct illuminating mode, but exists in a photosensitive material of the surface of the raw material of the product in a light diffraction radiation energy mode, therefore, an effect of changing the optical transmittance of the light stopping layer is achieved, the transmittance of the light stopping layer can be an optional value between 0 (light proofing) to 100% (light transmission), and thus, the different portions of the light stopping layer can have different optical transmittance.

Description

technical field [0001] The present application relates to the field of mask plates, in particular to a mask plate and a manufacturing method thereof. Background technique [0002] The mask plate is composed of a metal layer film or a light-blocking layer film and a substrate on which information such as graphics and characters are recorded on the surface. It is widely used in molds in industries such as IC, FPD, MEMS, and optical devices. [0003] Each area on the traditional optical mask has only two optical transmittances: 0 (opaque) or 100% (transparent). Production, the total graphic information of a product is divided into multi-layer sub-patterns according to the process requirements, and the sub-patterns are made into corresponding mask plates for exposure (there are as many layers of mask plates as there are layers of sub-patterns), each mask plate All have alignment marks, and during production, the alignment marks on each layer of sub-pattern mask are overlapped a...

Claims

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Application Information

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IPC IPC(8): G03F1/00
CPCG03F1/00
Inventor 叶小龙黄执祥
Owner 深圳市龙图光电有限公司
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