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Apparatus and method for processing a coherent radiation beam

A technology of radiation beam and coherence, which is applied in the direction of exposure device, measurement device, and optical waveguide coupling of photolithography process, and can solve problems such as difficult to provide space and uniformity

Active Publication Date: 2021-03-09
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, it has proven difficult to provide a low-cost system that can provide spatially uniform (e.g., no speckle or streaking) and time-stable intensity

Method used

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  • Apparatus and method for processing a coherent radiation beam
  • Apparatus and method for processing a coherent radiation beam
  • Apparatus and method for processing a coherent radiation beam

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Embodiment Construction

[0023] This specification discloses one or more embodiments that incorporate the features of this invention. The disclosed embodiments are merely illustrative of the invention. The scope of the invention is not limited to the disclosed embodiments. The invention is defined by the appended claims.

[0024] References to "one embodiment," "an embodiment," "example embodiment," etc. in describing embodiments and in the specification indicate that the described embodiments may include a particular feature, structure, or characteristic, but that each embodiment may not Must include a particular feature, structure or property. Moreover, such phrases are not necessarily referring to the same embodiment. In addition, when a particular feature, structure or characteristic is described in conjunction with an embodiment, it is to be understood that it is within the purview of those skilled in the art to implement such feature, structure or characteristic in combination with other embo...

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Abstract

Apparatus and methods for processing a coherent radiation beam are disclosed. In one arrangement, an optical system receives a coherent radiation beam. The radiation beam includes components distributed over one or more radiation beam spatial modes. The waveguide supports multiple waveguide spatial modes. The optical system directs multiple components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the waveguide such that each of the multiple components couples to a different set of waveguide spatial modes, each set comprising one or more a waveguide space mode.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from EP application 16182256.4 filed on 1 August 2016, the entire content of which is hereby incorporated by reference. technical field [0003] The present invention relates to an apparatus and method for processing a radiation beam having coherence, an inspection apparatus and inspection method, and a lithography apparatus and method for performing a lithography process. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually to a target portion of the substrate. For example, lithographic equipment can be used to fabricate integrated circuits (ICs). In this case, a patterning device (which is alternatively referred to as a mask or reticle) may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02B6/42G02B6/26
CPCG02B6/4204G02B6/4296G03F7/70583G02B6/262G01N2201/0631G03F7/7015G03F7/70616G01N21/9501G03F7/70075G03F7/70625G03F7/70633G01N2021/8822G03F7/706847G01N21/8806
Inventor S·A·戈登N·潘迪D·阿克布鲁特T·W·图克J·M·M·德维特
Owner ASML NETHERLANDS BV