Preparation method of anti-reflection array substrate and anti-reflection array substrate prepared therefor
An array substrate and substrate substrate technology, applied in the field of anti-reflection array substrates, can solve the problems of lowering the actual contrast and affecting the display effect, and achieve the effect of reducing light reflection and avoiding reflection
Active Publication Date: 2020-07-10
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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Problems solved by technology
[0002] In narrow bezel or bezel-less products, in order to achieve ultra-fine external circuit connections, the array substrate is usually placed on the light-emitting side. However, the array substrate of the traditional process is easy to reflect the external ambient light because the metal signal line located on the outermost side, resulting in a mirror image. , so that the actual contrast perceived by the human eye is greatly reduced, thereby affecting the display effect, so it is necessary to provide a method for preparing an anti-reflection array substrate that can reduce signal line reflections and an anti-reflection array substrate prepared by the preparation method
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[0028] The following will clearly and completely describe the technical solution in the application with reference to the accompanying drawings in the implementation manner of the application. Apparently, the described implementations are only some of the implementations of this application, not all of them. Based on the implementation manners in this application, all other implementation manners obtained by those skilled in the art without creative efforts shall fall within the scope of protection of this application.
[0029] see figure 1 , figure 1 It is a schematic flow chart of the preparation method of the anti-reflective array substrate provided in this application.
[0030] The preparation method of the anti-reflection array substrate includes:
[0031] 101: Provide a base substrate 10 .
[0032] Please also refer to figure 2 , figure 2 It is a cross-sectional view of the base substrate in the preparation method of the anti-reflective array substrate provided i...
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Disclosed is a method for preparing an anti-reflection array substrate, the method comprising: providing a base substrate (10); preparing a photoresist solution, wherein the photoresist solution comprises an acrylate metal precursor, acrylic acid resin, a photo initiator, a solvent and an auxiliary; coating the photoresist solution on the base substrate (10) to form a photoresist layer (20); treating the photoresist layer (20) by means of a yellow-light process to form a patterned structure (21); and carrying out heat treatment on the patterned structure (21) to form an anti-reflection conductive structure (22), so as to obtain an anti-reflection array substrate.
Description
technical field [0001] The present application relates to the display field, in particular to a method for preparing an anti-reflective array substrate and the prepared anti-reflective array substrate. Background technique [0002] In narrow bezel or bezel-less products, in order to achieve ultra-fine external circuit connections, the array substrate is usually placed on the light-emitting side. However, the array substrate of the traditional process is easy to reflect the external ambient light because the metal signal line located on the outermost side, resulting in a mirror image. , so that the actual contrast perceived by the human eye is greatly reduced, thereby affecting the display effect, so it is necessary to provide a method for preparing an anti-reflection array substrate that can reduce signal line reflections and an anti-reflection array substrate prepared by the preparation method . Contents of the invention [0003] The present application provides a method...
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IPC IPC(8): G03F7/027H01L27/12
CPCG03F7/027H01L27/124
Inventor 张霞刘刚
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD