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Transparent conductive film

A transparent conductive film, transparent conductive technology, applied to the conductive layer on the insulating carrier, layered products, chemical instruments and methods, etc., can solve the problems of lower resistance, lower transmittance, difficult high transmittance, etc., to achieve Effects of improving electrical conductivity, improving corrosion resistance, and reducing electrical resistivity

Inactive Publication Date: 2019-05-03
广东迪奥应用材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, if the ITO film is thickened, the transmittance will decrease
In addition, it is often difficult to thermally anneal thin film substrates at elevated temperatures
Therefore, in the case of an ITO film provided on a film substrate, it is difficult to maintain a high transmittance while reducing the resistance.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] The transparent conductive film provided in this embodiment includes a transparent substrate 10, a first transparent conductive medium protection layer 20, a first metal protection layer 30, a metal alloy layer 40, a second metal protection layer 50, a Two transparent conductive medium protective layers 60, wherein, the material of the base material is PET, and its thickness is 80 μm; The material of the first transparent conductive medium protective layer is AZO, and its thickness is 25nm; The material of the first metal protective layer is Mo, its The thickness is 0.5nm; in the metal conductive layer, the content of Ag is 99%, the content of aluminum is 0.5%, the content of copper is 0.5%, and its thickness is 5nm; the material of the second metal layer is Mo, and its thickness is 2nm; The material of the second transparent dielectric layer is AZO, and its thickness is 60nm.

Embodiment 2

[0026] The transparent conductive film provided in this embodiment includes a transparent substrate 10, a first transparent conductive medium protection layer 20, a first metal protection layer 30, a metal alloy layer 40, a second metal protection layer 50, a Two transparent conductive medium protective layers 60, wherein, the material of the base material is COP, and its thickness is 125 μ m; the material of the first transparent conductive medium protective layer is GZO, and its thickness is 35 nm; the material of the first metal protective layer is MoNb, and its The thickness is 0.7nm; in the metal conductive layer, the content of Ag is 99%, the content of aluminum is 1.5%, the content of copper is 0.5%, and its thickness is 5nm; the material of the second metal layer is MoNb, and its thickness is 1nm; The material of the second transparent dielectric layer is GZO, and its thickness is 50nm.

Embodiment 3

[0028] The transparent conductive film provided in this embodiment includes a transparent substrate 10, a first transparent conductive medium protection layer 20, a first metal protection layer 30, a metal alloy layer 40, a second metal protection layer 50, a Two transparent conductive medium protective layers 60, wherein, the material of the base material is PC, and its thickness is 100 μm; The material of the first transparent conductive medium protective layer is YZO, and its thickness is 25nm; The material of the first metal protective layer is MoTa, its The thickness is 1nm; in the metal conductive layer, the content of Ag is 99%, the content of aluminum is 2.5%, the content of copper is 0.5%, and its thickness is 9nm; the material of the second metal layer is MoTa, and its thickness is 1.5nm; The material of the second transparent dielectric layer is YZO, and its thickness is 40nm.

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Abstract

The invention relates to a transparent conductive film, which comprises a transparent substrate, a first transparent conductive medium protection layer, a first metal protection layer, a metal conductive layer, a second metal protection layer and a second transparent conductive medium protection layer. The metal protection layers are made of molybdenum, molybdenum alloy, rare earth simple substance or rare earth alloy. The metal conductive layer is made of silver-aluminum-copper alloy. According to the invention, the corrosion resistance of a silver alloy film is improved, and the resistivityis reduced by three layers of metal. Therefore, the conductive characteristic of the silver alloy is improved. Especially, due to the fact that no special element is introduced, molybdenum and molybdenum alloy which are conventionally used in the industry are used continuously. The production requirement can be met without the special process in the aspect of etching.

Description

technical field [0001] The invention relates to electronic products, in particular to a transparent conductive film. Background technique [0002] In recent years, as flexible wearables, solar cells, electrochromic, 3D curved surface displays, TFT-LCD and OLEDs have become larger, the requirements for low-cost, low-resistance, high-transmittance transparent conduction have become increasingly stringent. ITO It can no longer meet the basic needs of flexible substrates, so a series of low-resistance, high-transmittance objects for people to choose, such as: Metal Mesh, nano-silver wires, carbon nanotubes and graphene, but among them Only Metal Mesh and nano-silver wire are relatively mature, and they are also the main materials that can replace ITO at present. However, the preparation process of Metal Mesh is complicated, expensive, and not cost-effective; while nano-silver wires are prone to electrochemical corrosion during use, resulting in short circuits and resulting in d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01B5/14B32B15/04
Inventor 黄华凛
Owner 广东迪奥应用材料科技有限公司