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Thin film surface processing method and thin film surface processing equipment

A surface treatment and thin film technology, which is applied in the field of thin film surface treatment methods and thin film surface treatment equipment, can solve problems such as poor uniformity of silicon oxide films, and achieve the effect of improving the effect of ELA process

Inactive Publication Date: 2019-05-10
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The embodiment of the present invention provides a film surface treatment method and film surface treatment equipment to solve the problem of poor uniformity of the silicon oxide film in the prior art due to the existence of mura

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  • Thin film surface processing method and thin film surface processing equipment
  • Thin film surface processing method and thin film surface processing equipment
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Embodiment Construction

[0032] In order to make the object, technical solution and advantages of the present invention more clear, the specific implementation of the film surface treatment method and film surface treatment equipment provided by the embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the preferred embodiments described below are only used to illustrate and explain the present invention, not to limit the present invention. And in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. It should be noted that the size and shape of each figure in the drawings do not reflect the actual scale, but are only intended to schematically illustrate the content of the present invention. And the same or similar reference numerals represent the same or similar elements or elements having the same or similar functions througho...

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Abstract

The invention discloses a thin film surface processing method and thin film surface processing equipment. According to the method and the equipment, surfaces of thin films are etched by adoption of hydrofluoric acid, so that substances on the surfaces of the thin films can be etched. The hydrofluoric acid on the etched surfaces of the thin films is cleaned by adoption of cleaning solution, so thatthe hydrofluoric acid remaining on the surfaces of the thin films can be removed, and the condition that the thin films are excessively etched by the remaining hydrofluoric acid can be avoided. The cleaned surfaces of the thin films are oxidized by adoption of ozone water, so that compact and uniform oxidization layers can be formed on the surfaces of the thin films. When an ELA process is carried out, the ELA process effect can be improved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a thin film surface treatment method and thin film surface treatment equipment. Background technique [0002] Low Temperature Poly-silicon Thin Film Transistor (LTPS TFT) process usually involves transforming amorphous silicon (a-Si) into polysilicon through Excimer Laser Annealing (ELA) process (PolycrystallineSilicon, p-Si) process. In order to improve the effect of the ELA process, it is generally necessary to pre-treat the surface of the amorphous silicon film before performing the ELA process, so that a silicon oxide film is formed on the surface of the amorphous silicon film. However, during the pretreatment process, uneven traces (ie, Mura) will appear on the surface of the amorphous silicon film to varying degrees. The existence of the mura will lead to poor uniformity of the formed silicon oxide film, thereby affecting the effect of the ELA process, and further advers...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/02H01L21/67
CPCH01L21/02068H01L21/321H01L21/02049H01L21/02661H01L21/67028
Inventor 邓治国王振晏熙郭昭李发业黄超刘杰刘岩李显杰
Owner BOE TECH GRP CO LTD