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A kind of Gan-based light-emitting diode epitaxial wafer and preparation method thereof

A technology of light-emitting diodes and epitaxial wafers, which is applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve problems such as drop, and achieve the effects of improving radiation recombination efficiency, improving injection efficiency, and improving droop effect

Active Publication Date: 2020-05-19
HC SEMITEK ZHEJIANG CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] In the process of realizing the present invention, the inventors have found that the prior art has at least the following problems: when the current density injected into the GaN-based LED exceeds a certain value (lower than the rated current of the LED), the quantum efficiency of the GaN-based LED will increase with the injection The increase of current, the phenomenon of turning from rising to falling, that is, the droop effect

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  • A kind of Gan-based light-emitting diode epitaxial wafer and preparation method thereof
  • A kind of Gan-based light-emitting diode epitaxial wafer and preparation method thereof
  • A kind of Gan-based light-emitting diode epitaxial wafer and preparation method thereof

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Embodiment Construction

[0027] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0028] In order to facilitate the understanding of the technical solutions provided by the embodiments of the present invention, the droop effect of the LED is firstly introduced. The droop effect of the LED refers to the phenomenon that the light efficiency of the LED will decrease when the LED chip is input with a large amount of power. There are many reasons for the droop effect, mainly including starvation recombination, non-equilibrium carrier recombination, line dislocation, carrier localization effect, electron overflow, and carrier caused by polarization effect (built-in electric field). (Electron and hole) asymmetric transfer. Among them, in the asymmetric carrier migration caused by the polarization effect, especially the el...

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Abstract

The invention discloses a GaN-based light emitting diode epitaxial wafer and a preparation method thereof, and belongs to the field of GaN-based light emitting diodes. The light emitting diode epitaxial wafer comprises a substrate and a buffer layer, a non-doped GaN layer, an N-type doped GaN layer, a low-temperature stress releasing layer, a BInGaN layer, a multi-quantum well layer, a low-temperature P-type GaN layer, an electron barrier layer, a high-temperature P-type GaN layer and a P-type contact layer which are sequentially deposited on the substrate, wherein the multi-quantum well layerincludes a plurality of stacked GaN barrier layers, two adjacent GaN barrier layers are provided with an InGaN well layer therebetween, the BInGaN layer is a BxIn<1.5x>Ga<1-2.5x>N layer, and x is greater than or equal to 0.1 and less than or equal to 0.3.

Description

technical field [0001] The invention relates to the field of GaN-based light-emitting diodes, in particular to a GaN-based light-emitting diode epitaxial wafer and a preparation method thereof. Background technique [0002] A GaN (gallium nitride)-based LED (Light Emitting Diode, light emitting diode), also called a GaN-based LED chip, generally includes an epitaxial wafer and electrodes prepared on the epitaxial wafer. The epitaxial wafer usually includes: a substrate, a buffer layer sequentially stacked on the substrate, a non-doped GaN layer, an N-type GaN layer, an MQW (Multiple Quantum Well, multiple quantum well) layer, an electron blocking layer, and a P-type GaN layer. layer and contact layer. When a current is injected into the GaN-based LED, the electrons in the N-type region such as the N-type GaN layer and the holes in the P-type region such as the P-type GaN layer enter the MQW active region and recombine to emit visible light. Wherein, the MQW layer is genera...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/06H01L33/12H01L33/32H01L33/00
Inventor 陶章峰乔楠张武斌程金连李鹏胡加辉
Owner HC SEMITEK ZHEJIANG CO LTD