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Complex Amplitude Shaping Method for Improving Beam Intensity Uniformity

A complex amplitude and uniformity technology, which is applied in the field of complex amplitude shaping to improve the uniformity of beam light intensity, can solve the problems of large relative phase error, poor beam light intensity uniformity, and general shaping effect of arbitrary curves, etc., to achieve good uniformity , good shaping effect and wide range of beam types

Inactive Publication Date: 2020-10-09
CENT SOUTH UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing algorithm that can simultaneously shape the amplitude and phase of the beam has the advantages of high diffraction efficiency, less non-target amplitude noise, and fast convergence. Disadvantages of general curve shaping effect

Method used

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  • Complex Amplitude Shaping Method for Improving Beam Intensity Uniformity
  • Complex Amplitude Shaping Method for Improving Beam Intensity Uniformity
  • Complex Amplitude Shaping Method for Improving Beam Intensity Uniformity

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Embodiment Construction

[0047] Such as figure 1 Shown is a schematic flow chart of the method of the present invention: the complex amplitude shaping method for improving the light intensity uniformity of the light beam provided by the present invention includes the following steps:

[0048] S1. Obtain the original parameters of the target beam, and calculate the target phase data of the input plane according to the target complex amplitude data of the output plane;

[0049] During specific implementation, in order to obtain the amplitude A of the target beam t and the phase P of the target beam t , so that the target complex amplitude U of the output plane is obtained t =A t ·exp(i·P t ); wherein exp () is an exponential function with a constant e as a base, and i is an imaginary number unit;

[0050] At the same time, the complex amplitude U of the input plane is obtained by using the backpropagation function 0 =T -1 [U t ], and according to the complex amplitude U of the input plane 0 Cal...

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Abstract

The invention discloses a complex amplitude shaping method for improving light intensity uniformity of a light beam, which comprises the following steps: acquiring original parameters of a target light beam and calculating target phase data of an input plane; initializing the light beam shaping parameters; calculating complex amplitude data of the input plane and an output plane; introducing a phase disturbance term into the target phase parameters of the target light beam and calculating corrected complex amplitude data of the target light beam; calculating corrected phase data of the input plane; repeating the steps until conditions are met, and taking the finally obtained corrected phase data of the input plane as a pure phase hologram. According to the method, a shaping result with more uniform light intensity and higher diffraction effect can be obtained, the relative error can be rapidly reduced, a pure phase hologram can be provided, and target light beam shaping of any shape amplitude and phase with higher quality and better performance parameters can be conveniently obtained; the method is rapid, good in uniformity, high in light utilization rate, good in shaping effect and wide in variety of the light beam suitable for shaping.

Description

technical field [0001] The invention specifically relates to a complex amplitude shaping method for improving the light intensity uniformity of light beams. Background technique [0002] Traditional lasers can only produce light intensity beams with a Gaussian profile, but in actual scientific research and production, such as micro- and nano-scale material micromachining, optical manipulation, and research on biological macromolecules, there are different requirements for the profile and phase distribution of the beam. , so it is necessary to shape the laser beam. A spatial light modulator (SLM) is a device that can modulate the spatial distribution of light waves. By loading a hologram on the SLM and modulating the wavefront of the incident beam, the target complex amplitude beam that meets the design requirements is obtained to achieve Three-dimensional manipulation of particles or organelles. The designed phase distribution can also be made into a phase plate for optica...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B27/00G02B27/09
Inventor 陶少华包栋杰
Owner CENT SOUTH UNIV