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An auxiliary device for spectral diagnosis

An auxiliary device and spectral diagnosis technology, which is applied in material excitation analysis, thermal excitation analysis, etc., and can solve problems such as inability to realize fixed-point acquisition and mobile acquisition, large plasma jet light intensity value, and inability to achieve plasma jet characteristic spectral diagnosis.

Active Publication Date: 2021-08-31
GUANGDONG INST OF NEW MATERIALS
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  • Application Information

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Problems solved by technology

However, the emission spectrometer directly diagnoses the ultra-low pressure plasma spray jet, and faces the following difficulties: 1) The light intensity of the plasma jet is too large, even if the slit of the emission spectrometer is adjusted, it is far higher than the measurement range of the instrument; 2) Fixed-point acquisition and The transformation of mobile acquisition makes it impossible to realize multi-position, multi-angle, multi-node plasma jet characteristic spectrum diagnosis

Method used

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  • An auxiliary device for spectral diagnosis
  • An auxiliary device for spectral diagnosis
  • An auxiliary device for spectral diagnosis

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Embodiment 1

[0035] figure 1 It is a schematic structural diagram of the spectral diagnosis auxiliary device 100 provided in this embodiment. see figure 1 , This embodiment provides an auxiliary device 100 for spectral diagnosis, which is mainly used for monitoring the plasma jet characteristics of the ultra-low pressure plasma spraying device 101 with the optical emission spectrometer 103 . The spectral diagnosis auxiliary device 100 includes: a moving positioning mechanism 105 and an optical path collecting mechanism 107 .

[0036] figure 2 A schematic diagram of a partial structure of the spectral diagnosis auxiliary device 100 provided in this embodiment Figure 1 ; image 3 A schematic diagram of a partial structure of the spectral diagnosis auxiliary device 100 provided in this embodiment Figure II ; Figure 4 A schematic diagram of a partial structure of the spectral diagnosis auxiliary device 100 provided in this embodiment Figure 3 ; Figure 5 A schematic diagram of a par...

Embodiment 2

[0054] The difference between this embodiment and Embodiment 1 is:

[0055] The ultra-low pressure plasma spraying of the present invention is equipped with an external adjustable spectral diagnosis auxiliary device 100 according to figure 1After the assembly is completed, the light-transmitting lens is moved up and down by the adjustment mechanism of the screw 131, and the laser 113 is assisted in positioning, so that the light-transmitting lens is located at a distance of 950mm from the jet axis and 800mm from the center of the flame. To debug the optical path acquisition system, the condenser lens 135 selects models with different focal lengths according to the distance from the light blocking plate 137, and the light blocking plate 137 selects the minimum aperture of 0.5mm, so that the passing light meets the measurement application range of OES. Then adjust the vertical support to realize the measurement of different radial light intensity values ​​of the jet, and the rad...

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Abstract

The invention discloses an auxiliary device for spectrum diagnosis and relates to the technical field of spectrum diagnosis for ultra-low pressure plasma spraying. The device is used to cooperate with an optical emission spectrometer to monitor the characteristics of the plasma jet of an ultra-low pressure plasma spraying device. It includes a mobile positioning mechanism and an optical path collection mechanism. The mobile positioning mechanism is arranged on the ultra-low pressure plasma spraying device for positioning operation, and the optical path collection mechanism is arranged on the mobile positioning mechanism to collect and monitor the plasma jet of the plasma spraying device after the mobile positioning mechanism is positioned. The spectral diagnosis auxiliary device can realize multi-position and multi-angle measurement, and can realize active selection of light direction and collection amount through lens and light barrier selection, and can also realize spatial resolution measurement through Abel conversion. At the same time, through the use of optical emission spectrometer (OES), online diagnosis of OES on VLPPS can be realized, which can not only guide the development of new processes, but also monitor the coating quality and equipment operation status.

Description

technical field [0001] The invention relates to the technical field of spectrum diagnosis of ultra-low pressure plasma spraying, in particular to an auxiliary device for spectrum diagnosis. Background technique [0002] As the application of thermal spray coating becomes more and more extensive, the need for online diagnosis of thermal spray process becomes more and more urgent. There are two main advantages: one is to speed up the development of new processes, and the other is to monitor the process to Ensure reliable quality and sustainable production. [0003] Ultra-low pressure plasma spraying (VLPPS) is a type of plasma spraying technology with higher vacuum developed based on low pressure plasma spraying (LPPS), including vacuum plasma spraying (VPS), low pressure plasma spraying-thin film technology (LPPS-TF) ), plasma spraying-physical vapor deposition (PS-PVD) and plasma spraying-chemical vapor deposition (PS-CVD), which have a wide range of applications in the pre...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/73
CPCG01N21/73
Inventor 邓子谦毛杰张岩刘敏张小锋牛少鹏邓春明邓畅光杨焜宋琛
Owner GUANGDONG INST OF NEW MATERIALS
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