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A kind of aluminum-silver alloy target material for vacuum magnetron sputtering and preparation method thereof

A vacuum magnetron sputtering, aluminum-silver alloy technology, applied in sputtering coating, vacuum evaporation coating, metal material coating process, etc., can solve the problem of poor corrosion resistance, and achieve good corrosion resistance and uniform color. , the effect of high brightness

Active Publication Date: 2021-07-30
沈阳东创贵金属材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The reflectivity of silver can reach 99%, and it has excellent electrical and thermal conductivity, but its application is limited due to its poor corrosion resistance

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] A method for preparing an aluminum-silver alloy target for vacuum magnetron sputtering, comprising the following steps:

[0039] First, Al is heated and melted in a resistance melting furnace, and then Ag is added. After Ag is completely melted in Al, metals such as Mn, Si, Sb, Cr, AlY intermediate alloy and Zn are added in turn. When the above metals are fully melted, the obtained Melt the alloy liquid, add 0.3% hexachloroethane powder of the mass of the molten alloy liquid, and carry out degassing and slagging. into a water-cooled copper mold to obtain an alloy ingot.

[0040] The alloy ingot is processed by hot forging, rolling, cutting, grinding and polishing. The hot forging temperature is 480°C, and the total deformation of hot forging is 50%. After hot forging, it is cooled to room temperature and rolled. The pass reduction rate is 10%, the total reduction rate is 50%, and the aluminum-silver alloy target material of 60×60×3.0mm is obtained, and its composition ...

Embodiment 2

[0042] A method for preparing an aluminum-silver alloy target for vacuum magnetron sputtering, comprising the following steps:

[0043] Firstly, Al is heated and melted in a resistance melting furnace, and then Ag is added. After the Ag is completely melted in Al, metals such as Mn, Si, Sb, Cr, AlY intermediate alloy and Zn are added in turn. When the above metals are fully melted, add Melt 0.5% hexachloroethane powder of the mass of the alloy solution for degassing and slagging. The melting temperature does not exceed 750°C. After standing for 5-10 minutes, the slag is removed. After refining, the molten alloy is poured into a water-cooled copper mold. Obtain alloy ingots.

[0044]The alloy ingot is processed by hot forging, rolling, cutting, grinding and polishing. The hot forging temperature is 500°C, and the total deformation of hot forging is 30%. After hot forging, it is cooled to room temperature and rolled. The pass reduction rate is 10%, the total reduction rate is 7...

Embodiment 3

[0046] A method for preparing an aluminum-silver alloy target for vacuum magnetron sputtering, comprising the following steps:

[0047] Firstly, Al is heated and melted in a resistance melting furnace, and then Ag is added. After the Ag is completely melted in Al, metals such as Mn, Si, Sb, Cr, AlY intermediate alloy and Zn are added in turn. When the above metals are fully melted, add Melt 0.3% hexachloroethane powder of the alloy liquid mass for degassing and slagging. The melting temperature does not exceed 750 ° C. After standing for 5-10 minutes, the slag is removed. After refining, pour the molten alloy into a water-cooled copper mold. Obtain alloy ingots.

[0048] The alloy ingot is processed by hot forging, rolling, cutting, grinding and polishing. The hot forging temperature is 500°C, and the total deformation of hot forging is 40%. After hot forging, it is cooled to room temperature and rolled. The pass reduction rate is 15%, the total reduction rate is 60%, and the...

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Abstract

The invention relates to an aluminum-silver alloy target material for vacuum magnetron sputtering and a preparation method thereof. The target material includes components and mass percentages of 39.0-70.0wt.% Al, 29.0-60wt.% Ag, 0.3-0.5wt.Zn%, 0.1-0.3wt.% Mn, 0.1-0.2wt.% Si, 0.05-0.1 wt.% Sb, 0.05-0.1 wt.% Cr, 0.01-0.02 wt.% Y. The production method is as follows: after heating and melting the aluminum, metal silver, manganese, silicon, antimony, chromium, aluminum yttrium master alloy and zinc are successively added, after melting, a slagging agent is added to remove the slag, and after pouring into a mold to form an ingot, Control the corresponding parameters for hot forging, rolling, cutting and surface treatment to obtain aluminum-silver alloy targets. After the target material prepared by the method is coated, a film layer with uniform color, good corrosion resistance and high brightness can be obtained, which has broad market application prospects.

Description

Technical field: [0001] The invention belongs to the technical field of non-ferrous metal metallurgy, and in particular relates to the processing and forming technology of non-ferrous metal alloys, in particular to an aluminum-silver alloy target material for vacuum magnetron sputtering and a preparation method thereof. Background technique: [0002] The reflectivity of silver can reach 99%, and it has excellent electrical and thermal conductivity, but its application is limited due to its poor corrosion resistance. Among non-ferrous metals, aluminum has a reflectivity of more than 80%, and its electrical and thermal conductivity is good, second only to silver, copper and gold. Moreover, the surface of aluminum and its alloys is easy to form a layer of dense and firm Al 2 o 3 Protective film, excellent corrosion resistance, and aluminum targets are widely used in plating reflective films, conductive films, semiconductor films, capacitor films, decorative films, protective ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C22C21/00C22C1/03C22C1/06
CPCC22C1/026C22C1/03C22C1/06C22C21/00C23C14/3414C23C14/35
Inventor 赵宏达刘革常占河柳泉于志凯
Owner 沈阳东创贵金属材料有限公司