Pulse vacuum arc plasma propeller with segmented microporous insulating anode

A technology of pulsed vacuum and plasma, applied in the direction of plasma, plasma utilization, thrust reverser, etc., can solve the problem of increased plasma generation, achieve the effect of increasing generation and propagation speed, and improving efficiency

Active Publication Date: 2019-07-12
BEIJING JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the plasma generation was not significantly increased compared to the conventional non-segmented bare anode electrode structure

Method used

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  • Pulse vacuum arc plasma propeller with segmented microporous insulating anode
  • Pulse vacuum arc plasma propeller with segmented microporous insulating anode
  • Pulse vacuum arc plasma propeller with segmented microporous insulating anode

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Embodiment

[0034] figure 1 It is a structural diagram of a pulsed vacuum arc plasma thruster with segmented microporous insulated anodes according to an embodiment of the present invention, referring to figure 1 , the pulsed vacuum arc plasma thruster includes: a cathode 1, an insulating sleeve 2, a first anode 3 and a second anode 4; the insulating sleeve is set on the outer surface of the cathode 1, and the insulating sleeve is a hollow cylindrical structure , the inside of the insulating sleeve is partially in contact with the outer surface of the cathode; the first anode 3 and the second anode 4 are spaced on the outer surface of the insulating sleeve 2, and one end with micropores of the second anode 2 is insulated from the Socket ends flush. The outer surface of the insulating sleeve 2 is in contact with the inner surfaces of the first anode 3 and the second anode 4, the first anode 3 is close to the cathode 1, the second anode 4 is far away from the cathode 1, and the outer surfa...

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Abstract

The invention provides a pulse vacuum arc plasma propeller with a segmented microporous insulating anode. The pulse vacuum arc plasma propeller comprises a cathode, insulating sleeves, first anodes and second anodes; the insulating sleeves sleeve the outer surfaces of the cathode, the insulating sleeves are hollow structures, the internal portions of the insulating sleeves are in partial contact with the outer surface of the cathode, the first anodes and the second anodes alternately sleeve the outer surfaces of the insulating sleeves, the outer surfaces of the insulating sleeves are in contact with the inner surfaces of the first anodes and the second anodes, the first anodes are close to the cathode, the second anode are far away from the cathode, the outer surfaces of the first anodes and the second anodes are respectively coated with insulation layers, the insulation layers of the second anodes are provided with micropores in a direction parallel to the insulating sleeves, and themicropores are located at one side far away from the cathode. The pulse vacuum arc plasma propeller obviously improves the generation amount and the propagation velocity of the plasmas on the premiseof not influencing the discharge of the propeller so as to improve the efficiency of the pulse vacuum arc plasma propeller.

Description

technical field [0001] The invention relates to the technical field of microsatellite thrusters, in particular to a pulsed vacuum arc plasma thruster with segmented microporous insulating anodes. Background technique [0002] The pulsed vacuum arc plasma thruster is an electromagnetic thruster with the characteristics of simple structure, small volume and light weight. Compared with traditional chemical propulsion systems, it requires low power input, can generate high specific impulse, and precisely controlled thrust, so it is very suitable for micro-satellite propulsion systems, performing position maintenance, orbit transfer and attitude of micro- and nano-satellites Adjustments to other spatial tasks. [0003] By far the biggest disadvantage of pulsed vacuum arc plasma thrusters is the low efficiency of the thrusters, which is mainly due to the low density and propagation velocity of the generated plasma source. Based on the previous research, the document "Tian Jia, L...

Claims

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Application Information

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IPC IPC(8): H05H1/34F03H1/00
CPCF03H1/0087H05H1/34
Inventor 田甲刘文正高永杰张文俊
Owner BEIJING JIAOTONG UNIV
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