Method for monitoring leakage rate of vacuum cavity

Abstract

The invention relates to a method for monitoring the leakage rate of a vacuum cavity and relates to a manufacturing technology of a semiconductor integrated circuit. An emission spectrum of a functional group in the vacuum cavity in the semiconductor manufacturing technology operation process is collected through a spectrum signal detector, the spectrum signal intensity waveform of the emission spectrum is obtained through emission spectrum signal processing equipment, the leakage rate of the vacuum cavity is monitored by judging whether the spectrum signal intensity waveform has a five-finger-mountain-shaped waveform section near 336.5 nm of the wave length of nitrogen or not, whether the leakage rate of the vacuum cavity is abnormal or not can be undoubtedly judged through the method, the cost is low, the leakage rate of a reaction cavity can be detected without the need of shutting down semiconductor manufacturing equipment, productivity is not affected, and thus the leakage rate ofthe vacuum cavity can be monitored continuously.

Description

technical field [0001] The invention relates to a semiconductor integrated circuit manufacturing process, in particular to a method for monitoring the leakage rate of a vacuum cavity. Background technique [0002] In the manufacturing process of semiconductor devices, part of the manufacturing process needs to be carried out in a reaction chamber in a vacuum environment. If there is a leak in the vacuum reaction chamber, that is, the atmosphere enters the reaction chamber, it will affect the quality of the semiconductor manufacturing process, and then affect the quality of the semiconductor device. device yield. [0003] Nitrogen (N2) is the gas with the highest content in the atmosphere, so it is used as the target gas for leak rate detection in the reaction chamber. At present, helium detectors are often used to detect the leakage rate of the reaction chamber. The helium detector can accurately detect the leakage of the atmosphere, but the specific leakage in the vacuum r...

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Problems solved by technology

In addition, the cost of helium detector equipment is relatively high, and the leakage rate of the reaction chamber needs to be shut down to detect the leakage rate of the reaction chamber, resulting in loss of production capacity, and it can only detect the leakage rate of the reaction chamber during detection, and the semiconductor manufacturing equipment is running Reaction chamber leak rate cannot be detected at this time, so continuous monitoring is not possible

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