Phase focusing image sensor and forming method and working method thereof

An image sensor and phase focusing technology, which is applied in image communication, electric solid-state devices, semiconductor devices, etc., can solve the problems of poor performance of image sensors, achieve the effect of improving performance and avoiding white spots

Inactive Publication Date: 2019-07-26
HUAIAN IMAGING DEVICE MFGR CORP
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  • Summary
  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0004] However, the performance of existing image sensors is poor

Method used

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  • Phase focusing image sensor and forming method and working method thereof
  • Phase focusing image sensor and forming method and working method thereof
  • Phase focusing image sensor and forming method and working method thereof

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Experimental program
Comparison scheme
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Embodiment Construction

[0034] As mentioned in the background, the performance of prior art phase focusing image sensors is poor.

[0035] A phase focus image sensor, please refer to figure 1 , including: a semiconductor substrate 100, the semiconductor substrate 100 includes several sub-pixel regions; a focus photosensitive unit 110 located in the semiconductor substrate, the focus photosensitive unit 110 includes a first focus photosensitive structure 111 and a second focus photosensitive structure that are separated from each other Structure 112, one focusing photosensitive unit 110 is located in two adjacent sub-pixel areas, the first focusing photosensitive structure 111 is located in one sub-pixel area, and the second focusing photosensitive structure 112 is located in the other sub-pixel area; located in the first focusing The color of the filter layer on the photosensitive structure 111 is the same as that of the filter layer on the second focus photosensitive structure 112 .

[0036] exist ...

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Abstract

The invention discloses a phase focusing image sensor and a forming method and a working method thereof. The phase focusing image sensor comprises a semiconductor substrate, the semiconductor substrate comprising a plurality of image capture regions, each image capture region comprising a first sub-pixel region, a second sub-pixel region, a third sub-pixel region and a fourth sub-pixel region, anda part of the image capture regions are first-class image capture regions; a focusing photosensitive unit positioned in a fourth sub-pixel region of the first type of image capture region and comprising a first focusing photosensitive structure and a second focusing photosensitive structure which are separated from each other; and a main photosensitive structure respectively positioned in each first sub-pixel region, each second sub-pixel region and each third sub-pixel region. The performance of the phase focusing image sensor is improved.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a phase focus image sensor and its forming method and working method. Background technique [0002] Many modern electronic devices involve imaging devices using image sensors, such as SLR cameras, ordinary digital cameras, video cameras, etc. At present, focusing methods widely used in imaging devices are mainly contrast focusing (Contrast Detection Auto Focus) and phase detection auto focusing (Phase Detection Auto Focus, PDAF). [0003] The working principle of phase detection autofocus is: reserve some pixels on the photosensitive element for phase detection, detect the intersection of two beams of light in the converging light of the lens imaging, and judge the intersection of the two beams of light The difference between the situation and when the light rays are focused on the image plane directs the movement of the lens so that the light beams converge on the ima...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H04N5/225H04N5/232H04N5/335H01L27/146
CPCH01L27/14621H01L27/14627H01L27/1461H04N23/54H04N23/67H04N25/00
Inventor 刘胜娜陈世杰黄晓橹
Owner HUAIAN IMAGING DEVICE MFGR CORP
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