Dividing device
A workpiece and annular frame technology, applied in the field of splitting devices, can solve the problems of incapable chip spacing, uneven heat shrinkage, etc.
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[0032] figure 1 The wafer W shown is, for example, a circular semiconductor wafer made of silicon as a raw material, and a plurality of dividing lines are set vertically on the front surface Wa of the wafer W. Furthermore, devices not shown in the figure are respectively formed in a plurality of grid-like regions partitioned by the planned division lines.
[0033] The wafer W is irradiated with a laser beam of a wavelength transparent to the wafer W along the planned dividing line, and the dividing starting point M (reformed layer M) is continuously formed at a predetermined depth inside the wafer W along the planned dividing line.
[0034] In addition, the division starting point M (modified layer M) is a region where the inside of the wafer W is modified by irradiation of the laser beam so that the intensity is lower than that of the surrounding area. Cracks may extend from the splitting starting point M toward the front Wa or back Wb of the wafer W, respectively. In addit...
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