Synchronous phase shift measurement system and method based on white light interference spectrum

Abstract

The invention provides a synchronous phase shift measurement system based on a white light interference spectrum. The synchronous phase shift measurement system based on the white light interference spectrum comprises a light source unit, a measurement interference unit, an image detection unit, a spectrum interference unit and a data processing unit, wherein the light source unit generates polarization light source signals for an illumination light source; the measurement interference unit processes the polarization light source signals to generate measurement polarization light source signals P and reference polarization light source signals S; the image detection unit enables a part of the measurement polarization light source signals P and the reference polarization light source signals S to form interference through a polarization analyzer in the front of a CCD camera; the signals are detected and processed by the CCD camera; one part of the signals is transmitted to the spectruminterference unit; and the spectrum interference unit splits light of the part of the measurement polarization light source signals P and the reference polarization light source signals S again, generates interference signals having 90 DEG phase difference, and transmits the interference signals to the data processing unit. According to the system in the invention, space phase-shifting is introduced; therefore, two-frame spectrum interference signals having 90 DEG phase difference are analyzed; and rapid and high-precision measurement on the surface topography can be realized.

Description

technical field [0001] The invention belongs to the field of optical precision measurement, and relates to a synchronous phase shift measurement system and method based on white light interference spectrum. Background technique [0002] In the field of micro-nano processing, the high-precision and rapid measurement of various parameters of micro-nano structures has always been the focus of researchers. At the micro-nano scale, the main measurement parameters of the micro-nano structure are geometric parameters including the length, width, height and surface roughness of the structure, material properties, three-dimensional morphology, surface film thickness, etc. These parameters largely affect and determine the performance and application fields of micro-nano devices. Therefore, in order to realize the functions of micro-nano devices, it is especially important to measure various characteristics of micro-nano structures with high precision and quickly. When performing sur...

AI Technical Summary

Problems solved by technology

The spatial phase shift system using multiple CCD cameras is expensive and complicated to install and adjust, and it is difficult to guarantee the consistency of multiple CCD cameras, and the difference in image quality will affect the measurement accuracy

The spatial phase shifting system using a single CCD camera requires optical devices such as phase masks, which are expensive

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