Optical waveguide and preparation method thereof

Abstract

The invention discloses a preparation method of an optical waveguide, comprising: step (a) of forming a coating layer on a semiconductor substrate; step (b) of etching the coating layer and forming acore layer slot; step (c) of depositing a core layer and a sacrifice layer sequentially; step (d) of performing surface flattening; step (e) of removing the sacrifice layer; step (f) of repeating steps (c) to (e) until the core layer slot is filled with the core layer; and step (g) of performing performance flattening and obtaining a waveguide core. The invention further provides an optical waveguide, comprising a semiconductor substrate; a coating layer located on the semiconductor substrate and being etched with a core layer slot; and a core layer filled in the core layer slot. Adopting thesolution can finally obtain a high-quality silicon nitride strip waveguide with the thickness thereof far exceeding a critical thickness.

Description

technical field [0001] The invention relates to the technical field of integrated optics, in particular to an optical waveguide and a manufacturing method thereof. Background technique [0002] Dielectric waveguides are the basic structural units of integrated optical systems and their components. The dielectric waveguide mainly plays the role of confinement, transmission and coupling of light waves. Dielectric waveguides can be divided into four categories according to the cross-sectional shape: cylindrical waveguides (optical fibers), film (planar) waveguides, rectangular (strip) waveguides and ridge waveguides. Thin-film waveguides and rectangular waveguides are commonly used in integrated optics. There are many types of materials used to form optical waveguides, and silicon nitride is currently a commonly used material for making optical waveguides. [0003] At present, the silicon nitride film growth and preparation methods mainly include PECVD (plasma enhanced chemi...

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Problems solved by technology

[0005] In order to overcome the technical problem of directly digging grooves on silicon dioxide in the prior art, there is a requirement for the width of the grooves, and when the width of the grooves is wider, a thicker silicon nitride optical waveguide cannot be obtained, and then a kind of optical waveguide is provided. Fabrication method that can fabricate wider optical waveguides with a thickness greater than 300 nanometers

[0006] In order to overcome the technical problem that the width of the groove is required in the method of digging a groove in the silicon dioxide lower cladding layer in the prior art, and a thicker silicon nitride optical waveguide cannot be obtained when the width of the groove is wider, a new method is provided. A method for manufacturing an optical waveguide capable of manufacturing a wider optical waveguide with a thickness exceeding 300 nanometers

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