Polishing solution polishing particle circularly extracting device

Abstract

The invention discloses a polishing solution polishing particle circularly extracting device which comprises a box body as well as a polishing solution storage device, a polishing solution ultrasonicatomization device, a polishing solution drying device, a polishing particle and airflow mixing device, and a polishing particle separating device all arranged in the box body, wherein a polishing solution stirring device is arranged in the polishing solution storage device; and polishing waste solution is collected and stirred in the polishing solution storage device, is atomized in the polishingsolution ultrasonic atomization device, enters the polishing solution drying device to be dried, then enters the polishing particle and airflow mixing device, and finally enters the polishing particle separating device, so that separation of particles with different masses is realized according to different gravity ranges of different particles. The polishing solution polishing particle circularly extracting device can recycle the polishing solution after polishing treatment to greatly lower the economic cost of the polishing process and increase the green manufacturing degree of the polishing process.

Description

technical field [0001] The invention relates to a polishing particle extraction device, in particular to a polishing liquid polishing particle circulation extraction device. Background technique [0002] At present, with the development of science and technology and the upgrading of the industry chain, the processing standards in various fields of society continue to rise, and the demand for smooth or ultra-smooth surface components is increasing. In the standard of the optical field, the surface accuracy of the complex curved surface element is required to be within a few tenths of a wavelength, and its surface roughness is required to be below 5 nanometers. It is an important research direction to control the factors that affect the polishing quality in each link during the polishing process, so as to improve the precision of the polished workpiece surface and reduce the surface roughness. However, during the polishing process, the core material polishing liquid requires ...

AI Technical Summary

Problems solved by technology

If the polishing liquid is not replaced in time, the exfoliated workpiece particles mixed in the polishing liquid will enter the scratches of the polishing particles on the surface of the workpiece when micro-cutting, weakening the cutting effect of the polishing particles and reducing the processing efficiency. Scratches on the polishing surface or uneven polishing removal degree caused by agglomeration or uneven dispersion of polishing particles

Although this kind of phenomenon can be eliminated in the subsequent polishing process, it greatly increases the polishing time and the amount of polishing liquid used, which increases the production cost of the product and reduces the overall surface quality

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