Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Color film substrate and manufacturing method thereof, and liquid crystal display device

A technology for color film substrates and substrates, applied in instruments, nonlinear optics, optics, etc., can solve the problems of uneven display, different heights, and different film thicknesses of liquid crystal panels in the display area of ​​liquid crystal panels, so as to reduce the phenomenon of uneven display, The effect of consistent film thickness

Inactive Publication Date: 2019-10-25
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
View PDF12 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The present application relates to a color filter substrate and a manufacturing method thereof, which are used to solve the problem in the prior art that the heights of the spacers in the display area and the non-display area of ​​the liquid crystal display panel are different, which causes the film thickness of the liquid crystal panel to be different. Causes the problem of uneven display in the display area of ​​the LCD panel

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Color film substrate and manufacturing method thereof, and liquid crystal display device
  • Color film substrate and manufacturing method thereof, and liquid crystal display device
  • Color film substrate and manufacturing method thereof, and liquid crystal display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Apparently, the described embodiments are only some of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application.

[0035] In the description of the present application, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Orientation indicated by rear, left, right, vertical, horizontal, top, bottom, inside, outside, clockwise, counterclockwise, etc. The positional relationship is based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a color film substrate and a manufacturing method thereof. A first spacer is disposed in a display area; and a second spacer is disposed in a non-display area. A virtual colorresistance layer is arranged in the non-display area and has the same color as a third color resistance layer; and the height of the first spacer is larger than or equal to that of the second spacer.The color film substrate has the following beneficial effects: because the virtual color resistance layer is arranged in the non-display area and the space of one part of non-display area is occupied, the height of the second spacer in the non-display area is equal to the height of the first spacer in the display area while the total amounts of the spacer solutions are same, so that the film thickness consistence of the display area and the non-display area is ensured and the occurrence of display unevenness is reduced; the virtual color resistance layer and the last color resistance layer inthe display area are made together and the virtual color resistance layer is slightly lower than the color resistance layer in the display area in a reasonable range, so that the operability of the non-display area is enhanced; and the process is simple.

Description

technical field [0001] The present application relates to the display field, in particular to a color filter substrate, a manufacturing method thereof, and a liquid crystal display device. Background technique [0002] With the rapid development of liquid crystal display technology (LCD, Liquid Crystal Display), major manufacturers have higher and higher requirements for panel image quality. The production of high-quality, Mura-free panels has become the ultimate pursuit of every panel factory. Due to differences in panel peripheral design, etc., display unevenness occurs around the display panel, that is, peripheral mura occurs. Among them, one of the most common reasons for peripheral Mura is that the film thickness of the non-display area around the display panel is inconsistent with the film thickness of the display area, resulting in the difference in box thickness. [0003] see attached figure 1 , is a schematic structural diagram 100 of a common display panel in th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1335G02F1/1339
CPCG02F1/133514G02F1/133516G02F1/13394G02F1/13396G02F1/133388G02F1/133512G02F1/1339
Inventor 俞云
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products