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Fabrication method of a small-pitch vertical cavity surface-emitting laser array

A technology of vertical cavity surface emission and laser array, which is applied in the direction of lasers, laser components, semiconductor lasers, etc., can solve the problem that the consistency of the channel shape of the light-emitting point cannot be guaranteed, so as to improve efficiency, simplify the existing process, Yield improvement effect

Active Publication Date: 2020-01-17
VERTILITE CO LTD
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  • Application Information

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Problems solved by technology

If it is expected to further reduce the pitch of the light-emitting units, if the width of the channel is directly reduced, since the limit of the photolithography process and dry etching process has been approached, the consistency of the channel morphology of different light-emitting points generated can no longer be achieved. ensure

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  • Fabrication method of a small-pitch vertical cavity surface-emitting laser array
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  • Fabrication method of a small-pitch vertical cavity surface-emitting laser array

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Embodiment Construction

[0022] The technical solutions in the embodiments of the present invention are clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0023] Such as figure 1 As shown, the local mesa arrangement of the existing vertical cavity surface emitting laser array, the dark circular area in the figure is the mesa structure, and the surrounding white is the etched structure. The general structure is a periodic or random arrangement, and only a few tables are listed in the figure for illustration. The diameter of the array unit mesa structure is generally determined by 2*oxidation length + ape...

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Abstract

The invention provides a preparation method of a small-pitch vertical cavity surface emitting laser array. Through the method, the latitude of precision etching and other links in the preparation process of the small-pitch vertical cavity surface emitting laser array can be improved. A fusion oxidation area is used in the process. The spacing of reflective units can be further reduced. The existing process is greatly simplified, and the efficiency is improved. The device yield can be greatly improved. The preparation method has many beneficial effects the prior art cannot provide.

Description

technical field [0001] The invention relates to the technical field of preparation of a vertical cavity surface emitting laser array (VCSEL), in particular to a preparation method capable of reducing the spacing of light-emitting holes on the array. Background technique [0002] At present, in the application scenarios of many smart devices such as 3D sensing (mobile phone, payment, security, etc.), vehicle sensing, and medical treatment, there is a huge market demand for vertical cavity surface emitting laser arrays, and its device density And size miniaturization also put forward higher requirements. In the existing VCSEL array manufacturing, in order to increase the device density, it is usually achieved by increasing the number of light-emitting points and reducing the pitch. However, due to the limitation of the current semiconductor manufacturing process level, the gap between two adjacent light-emitting units There is still some difficulty in further reducing the wid...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01S5/183H01S5/42
CPCH01S5/18344H01S5/423
Inventor 刘嵩梁栋
Owner VERTILITE CO LTD