A kind of nano-niobium aluminum yttrium/amorphous silicon nitride dual-phase superhard coating and its deposition method
A technology of niobium aluminum yttrium nitride and crystalline silicon nitride, applied in coating, metal material coating process, vacuum evaporation coating, etc. Solve problems such as low solid solution stability, and achieve the effect of good heat resistance and reduction of defects such as burrs and nail heads
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Embodiment 1
[0021] Tungsten carbide PCB micro drill, shank diameter 3.175mm, blade diameter 0.2mm, after degreasing, organic solvent cleaning, deionized water rinsing, drying, then put into the coating furnace. Vacuum to 1.0×10 -3 Below Pa, the temperature is kept at 200±5°C. The first step is to perform gas plasma cleaning on the workpiece substrate: Ar and H are introduced through the gas ion source 2 , the partial pressures are 0.2Pa and 0.1Pa respectively, the ion source current is 5A, the workpiece is applied with a pulsed negative bias, the frequency is 80KHz, the peak value is 100V, and the duty cycle is 90%, and the workpiece is plasma cleaned for 30min. The second step is to perform arc plasma cleaning on the workpiece: turn off the gas ion source, adjust the pulse negative bias to frequency 80KHz, peak value 700V, duty cycle 30%, Ar and H 2 The partial pressure is adjusted to 0.1Pa and 0.05Pa, the arc ion plating Nb target is turned on, the arc source current is 60A, and the w...
Embodiment 2
[0023] Tungsten carbide PCB micro drill, shank diameter 3.175mm, blade diameter 0.35mm, after degreasing, organic solvent cleaning, deionized water rinsing, drying, then put into the coating furnace. Vacuum to 1.0×10 -3 Below Pa, the temperature is kept at 200±5°C. The first step is to perform gas plasma cleaning on the workpiece substrate: Ar and H are introduced through the gas ion source 2 , the partial pressures are 0.2Pa and 0.1Pa respectively, the ion source current is 5A, the workpiece is subjected to pulsed negative bias, the frequency is 80KHz, the peak value is 150V, and the duty cycle is 90%, and the workpiece is plasma cleaned for 30min. The second step is to perform arc plasma cleaning on the workpiece: turn off the gas ion source, adjust the pulse negative bias to frequency 80KHz, peak value 800V, duty cycle 30%, Ar and H 2 The partial pressure is adjusted to 0.1Pa and 0.05Pa, the arc ion plating Nb target is turned on, the arc source current is 60A, and the wo...
Embodiment 3
[0025] The tungsten carbide PCB milling cutter with a shank diameter of 3.175mm and a blade diameter of 1.2mm is degreased, cleaned with organic solvents, rinsed with deionized water, dried, and loaded into a coating furnace. Vacuum to 1.5×10 -3 Below Pa, the temperature is kept at 250±5°C. The first step is to perform gas plasma cleaning on the workpiece substrate: Ar and H are introduced through the gas ion source 2 , the partial pressures are 0.2Pa and 0.1Pa respectively, the ion source current is 8A, the workpiece is applied with a pulsed negative bias, the frequency is 80KHz, the peak value is 200V, and the duty cycle is 90%, and the workpiece is plasma cleaned for 30min. The second step is to perform arc plasma cleaning on the workpiece: turn off the gas ion source, adjust the pulse negative bias to frequency 80KHz, peak value 1000V, duty cycle 30%, Ar and H 2 The partial pressure is adjusted to 0.1Pa and 0.05Pa, the arc ion plating Nb target is turned on, the arc sour...
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Abstract
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