Pump monitoring device, vacuum processing device, and vacuum pump
A technology of a vacuum processing device and a monitoring device, which is applied to the components, pumps, and pump elements of a pumping device for elastic fluids to prevent misjudgments
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no. 1 Embodiment approach -
[0031] figure 1 It is a diagram showing the semiconductor manufacturing apparatus 10 in the first embodiment. The semiconductor manufacturing apparatus 10 is a vacuum processing apparatus such as an etching apparatus. Such as figure 1 In the example shown, two vacuum pumps 1A and 1B are installed in the processing chamber 100, but the same can be applied to the case where three or more vacuum pumps are installed.
[0032] The vacuum pump 1A is installed in the processing chamber 100 via a valve 3A, and the vacuum pump 1B is installed in the processing chamber 100 via a valve 3B. The semiconductor manufacturing apparatus 10 includes a main control device 110 that controls the entire manufacturing apparatus including the vacuum pumps 1A and 1B and the valves 3A and 3B. The main control device 110 includes a monitoring device 4 that monitors whether the vacuum pumps 1A and 1B are abnormal. The vacuum pumps 1A and 1B are vacuum pumps of the same model, and each include a pump body ...
no. 2 Embodiment approach -
[0068] In the first embodiment described above, the motor current values MA and MB are used as the signal indicating the rotation state of the pump rotor 14. However, in the second embodiment, the signal indicating the rotation state is calculated based on the magnetic bearing control amount , The magnetic bearing control amount is generated based on the displacement signal of the displacement sensor. Such as Figure 5 As shown, the radial magnetic bearings 17A, 17B, and 17C are respectively provided with displacement sensors for detecting the floating position of the rotor shaft 15. The following describes a case where the displacement signals of the displacement sensors X2a, X2b, Y2a, and Y2b that detect the floating position in the radial direction are used as the signal indicating the rotation state.
[0069] Such as Figure 5 As shown, the radial magnetic bearing 17A includes two pairs of electromagnets, which are arranged to sandwich the rotor shaft 15. For one of the ele...
no. 3 Embodiment approach -
[0087] Picture 10 Is a diagram explaining the third embodiment, and Figure 4 It is also a block diagram showing the configuration of the vacuum pumps 1A and 1B provided in the semiconductor manufacturing apparatus 10. In the first and second embodiments described above, the pump monitoring device 120 is provided in the main control device 110 of the semiconductor manufacturing apparatus 10. On the other hand, in the third embodiment, the pump monitoring device 120 is provided in the controller 12 of each vacuum pump 1A, 1B. Other composition and Figure 4 The configuration shown is the same.
[0088] The pump monitoring device 120 provided in the controller 12 of the vacuum pump 1A acquires a signal showing the rotation state of the pump rotor 14 of the vacuum pump 1A, and acquires the rotation of the pump rotor 14 of the other vacuum pump 1B from the vacuum pump 1B via the communication line 40 Status signal. Similarly, the pump monitoring device 120 provided in the controll...
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