A positioning system and positioning device applied to a large aperture optical system

Abstract

The invention discloses a positioning device applied to a large-diameter optical system, which comprises a relatively fixed first limiting plate and a second limiting plate, a positioning seat, an elastic driving part that elastically resists the positioning seat, and a positioning seat that is fixed to the positioning seat. Connected damping buffers. When the elastic driving part pushes the positioning seat to move to the target position, the positioning seat is against the main mirror, and the main mirror exerts a reaction force on the positioning seat due to its own gravity, and the positioning seat overcomes the elastic resistance and damping force at the same time and moves away from the target position, so that the positioning The seat realizes double cushioning, so that the primary mirror is protected from the impact of the positioning seat; the elastic driving part pulls the positioning seat further away from the target position, eliminating the force applied by the positioning seat to the primary mirror, so that the primary mirror is completely supported by the existing supporting mechanism. Therefore, the positioning device applied to the large-aperture optical system provided by the present invention is beneficial to improve the repeated positioning accuracy of the primary mirror. The invention also discloses a positioning system applied to a large-aperture optical system comprising the above-mentioned positioning device.

Description

technical field [0001] The invention relates to the field of optical element auxiliary equipment, in particular to a positioning device applied to a large-diameter optical system. The present invention also relates to a positioning system applied to a large aperture optical system comprising the above positioning device. Background technique [0002] A large-aperture optical system usually includes a primary mirror and a support mechanism, and the support mechanism is used to support the primary mirror. In order for the primary mirror to have high working accuracy, the support mechanism needs to have high positioning accuracy. For example, the support mechanism including the optical axis and the mechanical axis needs to ensure that the optical axis and the mechanical axis can completely coincide when the primary mirror is integrated. [0003] During normal operation, the main mirror needs to be coated, and the coating of the main mirror will inevitably cause the movement of...

AI Technical Summary

Problems solved by technology

The existing positioning device usually includes a positioning block and a supporting spring connected with the positioning block. The positioning block relies on the elastic force of the supporting spring to resist the main mirror. Shock vibration, but due to the limited cushioning degree of the supporting spring, the positioning block still suffers from large shock vibration during the movement process, which easily affects the primary mirror, resulting in low repeat positioning accuracy of the primary mirror

[0006] In addition, after the primary mirror is positioned, the positioning block is still elastically against the primary mirror under the action of the supporting spring. Although the stiffness of the positioning block applied to the primary mirror is much smaller than the stiffness of the supporting mechanism, the positioning block supported by the supporting spring is still stable. The main mirror exerts a certain degree of force, and this force can hardly be eliminated. The main mirror cannot be completely supported by the supporting mechanism. In severe cases, the supporting force exerted by the positioning block may cause the mirror deformation of the main mirror to increase

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