A high-throughput method for efficient screening of high-quality carbon nanotube growth conditions
A technology of carbon nanotubes and growth conditions, applied in the high-throughput field of efficient screening of high-quality carbon nanotube growth conditions, can solve the problems of large influence of environmental and human factors, long time-consuming, poor repeatability, etc., to reduce artificial or environmental factors. the effect of improving efficiency
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Embodiment 1
[0055] In this embodiment, the high-throughput method for efficiently screening high-quality carbon nanotube growth conditions is as follows:
[0056] First, the ion beam deposition method was combined with the "quaternary template method", and the mask was rotated several times during the process of physical deposition to prepare the catalyst film, and Co catalyst films with different thicknesses were prepared on the marked silicon wafers. The thickness range of Co was 0~1.575nm (the thickness interval is 0.025nm, 64 kinds of thicknesses in total), see the procedure figure 2 . Oxidize the Co catalyst sample at 500°C and an air atmosphere for 10min, and the sample is pushed out of the high-temperature zone; then the reaction furnace is heated to 800°C in an argon atmosphere (during the heating process, the argon flow rate is 400 ml / min, and the reaction furnace temperature rise rate 25°C / min), the sample is pushed into the high temperature zone, reduced for 7 minutes (the hy...
Embodiment 2
[0059] In this embodiment, the high-throughput method for efficiently screening high-quality carbon nanotube growth conditions is as follows:
[0060] First, the ion beam deposition method was combined with the "quaternary template method", and the mask was rotated several times during the process of physical deposition to prepare the catalyst film, and Co catalyst films with different thicknesses were prepared on the marked silicon wafers. The thickness range of Co was 0~1.575nm (the thickness interval is 0.025nm, 64 kinds of thicknesses in total), see the procedure figure 2 . Oxidize the Co catalyst sample at 500°C and an air atmosphere for 10min, push the sample out of the high-temperature zone, and then raise the temperature of the reaction furnace to 850°C in an argon atmosphere (during the heating process, the argon flow rate is 400 ml / min, and the heating rate of the reaction furnace 25°C / min), the sample is pushed into the high temperature zone, reduced for 7 minutes...
Embodiment 3
[0063] In this embodiment, the high-throughput method for efficiently screening high-quality carbon nanotube growth conditions is as follows:
[0064] First, the ion beam deposition method is combined with the "quaternary template method", and the mask plate is rotated several times during the process of physical deposition to prepare the catalyst film, and different thicknesses of Co catalyst films are prepared on the marked silicon wafer - the thickness of Co The range is 0~1.575nm (thickness interval is 0.025nm, 64 kinds of thicknesses in total), see the flow chart figure 2 . Oxidize the Co catalyst sample at 500°C and an air atmosphere for 10min. After the sample is pushed out of the high-temperature zone, the reaction furnace is heated to 900°C in an argon atmosphere (during the heating process, the argon flow rate is 400 ml / min, and the reaction furnace is heated. The speed is 25°C / min), the sample is pushed into the high temperature zone, and reduced for 7 minutes (th...
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Abstract
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