System and method for detecting photoelectric performance of a large number of miniature surface-emitting photoelectric chip arrays

Abstract

The invention discloses a system and method for detecting the photoelectric performance of a large number of miniature surface-emitting photoelectric chip arrays. The system includes a transfer driving device, a transfer head, a substrate holding table, a detection circuit substrate, a chip holding table, and an optical detector. The substrate holding table, the detection circuit substrate, and the chip holding table are successively arranged on the same side of the transfer driving device. The transfer head is fixedly mounted on the transfer driving device. The optical detector is located directly below the detection circuit substrate. The method includes the following steps: S1, putting a chip array; S2, adsorbing the chip by negative pressure; S3, preparing for chip detection; S4, detecting the photoelectric performance, S5, transferring and releasing the chip; and S6 cyclically picking up and detecting the chip. The system can realize the simultaneous detection of the photoelectricperformance of a large number of miniature surface-emitting photoelectric chipsets during the process of transferring large number of chipsets, has high detection efficiency, and is suitable for thephotoelectric performance of a large number of miniature surface-emitting photoelectric chips, such as miniature LED chips or small LED chips.

Description

technical field [0001] The invention relates to the technical field of detection of surface-emitting photoelectric chips, in particular to a system and method for detecting a large amount of photoelectric properties of a miniature surface-emitting photoelectric chip array. Background technique [0002] Surface-emitting optoelectronic chips, such as LED chips, are widely used in the display industry. With the continuous improvement of image definition requirements, the size of chips will also tend to be miniaturized. The side length of traditional display LED chips is more than 250 microns, and the size of micro LED (Micro LED) chips in the future will be in the micron level below 100 microns, which will bring huge challenges to the performance measurement method and chip transfer method. [0003] At present, the measurement methods of photoelectric parameters of surface-emitting photoelectric chips are mainly: [0004] (1) Electrical properties, such as the relationship bet...

AI Technical Summary

Problems solved by technology

[0007] (1) In terms of electrical performance testing: such as figure 1 As shown, since the measurement of the probe 3 is based on the premise of good electrical contact, but in the actual measurement, due to the influence of the surface flatness of the chip substrate 1, the arrangement position of the surface emitting photoelectric chip 2, and the spatial distribution of the probe 3 itself, As a result, a plurality of probes 3 generally can only focus on a row of adjacent surface-emitting photoelectric chips 2 at the same time, and it is impossible to realize a large-scale synchronous detection of the surface-emitting photoelectric chips 2;

[0008] (2) In terms of optical performance testing: such as figure 2 As shown, since multiple probes 3 can only contact the surface-emitting photoelectric chips 2 with a relatively short distance at the same time, the surface-emitting photoelectric chips 2 have a large emission angle, and the adjacent surface-emitting photoelectric chips 2 will interfere with each other when they emit light at the same time. , so it is impossible to simultaneously measure the optical properties of multiple surface-emitting optoelectronic chips 2

[0010] To sum up, in the product fields of microLED and miniLED, which require a huge number of chips in the future, traditional detection methods can no longer meet the needs of development. The rapid, batch, economical and reliable mass transfer and mass detection technology of surface emitting photoelectric chips has a huge potential. market application

Images