A kind of surface tough anti-erosion protective coating and its preparation method and application
A protective coating and anti-erosion technology, which is applied in the direction of coating, metal material coating process, vacuum evaporation plating, etc., can solve the problems of inability to achieve anti-erosion effect, and achieve easy large-area uniform deposition and distribution Homogeneous, densely structured effect
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[0043] Another aspect of the embodiments of the present invention provides a method for preparing an anti-erosion protective coating, which includes:
[0044] provide a substrate;
[0045]And, using the metal Me target as the target material, and using inert gas and nitrogen as the working gas, the first MeN layer, the MeN spring structure layer and the second MeN layer are sequentially deposited on the substrate by using DC magnetron sputtering technology, Prepare the surface tough and anti-erosion protective coating; wherein, the first MeN layer and the second MeN layer are formed by a plurality of erected MeN nanocrystals closely arranged, and the length direction of the erected nanocrystals is parallel to the The thickness direction of the coating; the MeN spring structure layer is formed by a plurality of small units closely arranged, and each small unit includes a first single layer formed by a plurality of first tilted MeN nanocrystals closely arranged and formed by a p...
Embodiment 1
[0063] In this embodiment, the coating structure is "vertical structure + spring structure + vertical structure", and the preparation method includes the following steps:
[0064] (1) The cemented carbide substrate was ultrasonically cleaned with acetone and ethanol for 15 minutes, dried and placed in a vacuum chamber, and pre-vacuumized to 2.0×10 -5 Torr; Then, 37 sccm of argon gas was introduced into the chamber, a DC pulse bias voltage of -100V was applied to the substrate, and the surface of the substrate was etched by an ion beam for 30 minutes;
[0065] (2) Make the surface of the substrate perpendicular to the target, argon and nitrogen (20sccm:20sccm) are introduced into the cavity, the DC magnetron sputtering source is turned on, the DC magnetron sputtering target current is 3.0A, and the substrate DC pulse bias is -300V, sputtering titanium target, depositing a coating of 775nm on the surface of the substrate to form the first TiN layer;
[0066] (3) Make the deflec...
Embodiment 2
[0071] In this embodiment, the coating structure is "vertical structure + spring structure + vertical structure", and the preparation method includes the following steps:
[0072] (1) The high-speed steel substrate was ultrasonically cleaned with acetone and ethanol for 15 minutes, dried and placed in a vacuum chamber, and pre-vacuumized to 2.0×10 -5 Torr; Then, 37 sccm of argon gas was introduced into the chamber, a DC pulse bias voltage of -100V was applied to the substrate, and the surface of the substrate was etched by an ion beam for 30 minutes;
[0073] (2) Make the surface of the substrate perpendicular to the target, argon and nitrogen (20sccm:20sccm) are introduced into the cavity, the DC magnetron sputtering source is turned on, the DC magnetron sputtering target current is 3.0A, and the substrate DC pulse bias is -300V, sputtering titanium target, depositing a coating of 450nm on the surface of the substrate to form the first TiN layer;
[0074] (3) Make the deflec...
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Abstract
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