Multi-wavelength InGaN/GaN multi-quantum well structure based on GaN dodecahedral cone and preparation method thereof
A multi-quantum well structure and multi-quantum well layer technology, which is applied in the field of semiconductor light-emitting devices, can solve the problems of reducing the working efficiency and device life of semiconductor components, affecting the performance stability of GaN-based optoelectronic devices, surface damage and pollution, and achieving realization Large-scale growth and application, improved internal quantum efficiency, and low cost effects
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[0035] The present invention will be further elaborated below in conjunction with the accompanying drawings and specific embodiments.
[0036] A multi-wavelength InGaN / GaN multiple quantum well structure based on GaN dodecahedral cones, through thermal H 4 PO 3 Etch the N-face self-supporting GaN substrate material to form a micro-nano GaN dodecahedron structure; use H 4 PO 3 The solution is heated and etched, and the micro-nano GaN dodecahedron is obtained by etching, and the InGaN / GaN multiple quantum well layer is grown on the GaN dodecahedron template by using metal organic chemical vapor phase epitaxy (MOCVD).
[0037] Such as figure 1 As shown, the micro-nano GaN dodecahedron is a dodecahedron composed of twelve triangular faces, and the space group of the wurtzite structure is , there are hexagonal rotational symmetry and mirror symmetry. The twelve-sided cone reflects the symmetry of the wurtzite structure. The structure of the twelve-sided cone is composed of six...
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