A film coating device for preventing offset in semiconductor production

Abstract

The invention discloses a coating device for semiconductor production that prevents deviation. A coating device for semiconductor production that prevents deviation includes a device main body, a vertical screw rod, a connecting sleeve, a first rotating shaft, a slot, and a second coating device, a second rotating shaft, a second gear, a first threaded mandrel, a first bearing, a rotating turntable, semiconductors to be processed and fan blades. The upper end of the main body of the device is provided with a first motor. The fixing device provided in the semiconductor production coating device for preventing deviation, artificially turns the knob on the fixing device to make the second screw mandrel rotate, and the second screw mandrel is threadedly connected with the first clamping block, so that the first screw mandrel is screwed. The clamping block moves on the horizontal plane, driving the sliding block to move on the slide rail, so as to facilitate the adjustment of the position of the first clamping block. By adjusting the position of the first clamping block, it is convenient to adjust the distance between the first clamping block and the second clamping block, so that Clamp the semiconductor to be processed to prevent the semiconductor to be processed from shifting.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a coating device for semiconductor production that prevents offset. Background technique [0002] Semiconductor is a conductive material between conductors and insulators. Semiconductors are used in a wide range of fields. For example, household appliances need to use semiconductor materials. Generally, semiconductors need to be coated in the production process of semiconductors. [0003] Coating devices are commonly used equipment for semiconductor production. In some semiconductor production processing workshops, coating devices for semiconductor production are required. The coatings for semiconductor production mostly use the spin coating method to coat semiconductors. This coating device for semiconductor production There are many types on the market, but the current semiconductor production coating devices on the market are prone to misalignment during use, which is t...

AI Technical Summary

Problems solved by technology

[0004] The object of the present invention is to provide a coating device for semiconductor production that prevents offset, so as to solve the troublesome problem that semiconductors are prone to offset when using the coating device for semiconductor production that is currently on the market.

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