Semiconductor device

Abstract

A semiconductor device includes first and second source / drain regions, a core channel region, a barrier layer, a shell, and a gate stack. The core channel region is between the first and second source / drain regions and is doped with first dopants. The barrier layer is between the core channel region and the second source / drain region and is doped with second dopants. The shell is over the core channel region and the barrier layer. The gate stack is over the shell.

Description

technical field [0001] The present disclosure relates to semiconductor devices and methods of manufacturing the same. Background technique [0002] The semiconductor integrated circuit industry has experienced rapid growth over the past few decades. Technological advances in semiconductor materials and design have produced ever smaller and more complex circuits. These semiconductor material and design advances have been made possible because the technologies associated with processing and manufacturing have also undergone technological advancements. In the course of semiconductor evolution, the number of interconnect devices per unit area has increased as the size of the smallest component that can be reliably produced decreases. [0003] However, many challenges also increase as the size of the smallest components decreases. As features get closer together, leakage currents become more pronounced, signals can cross more easily, and power usage becomes a significant conce...

AI Technical Summary

Problems solved by technology

However, existing Tunneling Field Effect Transistors are not satisfactory in every respect

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