Heating plate for MOCVD reaction chamber

A heating plate and reaction chamber technology, applied in the direction of ohmic resistance heating, electric heating device, gaseous chemical plating, etc., can solve the problems of hidden short circuit, uneven heating, unreasonable allocation of heating plate retention area, etc., to improve stability, The effect of increasing lifespan

Pending Publication Date: 2020-04-10
江苏实为半导体科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] In order to solve the following three technical problems: 1. The overall deformation of the traditional heating plate after heating, resulting in a local short circuit; 2. In order to ensure stable heating of the traditional heating plate, the electrodes of the axisymmetric heating plate are on the same side, which is prone to short circuit hazards; 3. The traditional heating plate The unreasonable distribution of the heating plate retention area leads to uneven heating, and it is easy to cause local deformation and other problems

Method used

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  • Heating plate for MOCVD reaction chamber
  • Heating plate for MOCVD reaction chamber
  • Heating plate for MOCVD reaction chamber

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Embodiment Construction

[0027] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.

[0028] In order to solve the three technical problems in the prior art, the present invention provides a heating plate, which includes several sets of heating fins with an even number. In specific use, even groups of heating chips need to divide the heating chips into two groups, and each group is connected in parallel with two poles respectively connected to the power supply. Generally, the number of heating chips can also be set to 4 groups or 6 groups, etc. Although the more groups are, the easier it is to cause heating instability, but for a larger area that needs to be heated, multiple groups of heating chips can be used to extend the heating chip. lifespan.

[0029] All heating sheets are arranged symmetrically to the center; the shape of each group of heating sheets is arc-shaped and expands outward from the center point O; th...

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Abstract

The invention discloses a heating plate for an MOCVD reaction chamber. The heating plate for the MOCVD reaction chamber comprises an even number of a plurality of groups of heating pieces; all heatingpieces are in centrosymmetric arrangement; the shape of each group of the heating pieces is an arc shape which is round about extended outwards from a centre point O; the roundabout inflection pointof adjacent groups of the heating pieces are staggered with each other; and the free ends of each group of the heating pieces are respectively connected to the two poles of a power supply. The heatingplate for the MOCVD reaction chamber has the beneficial effects that the defect of the structure of the conventional heating plate is overcome, the stability of use is improved, and the service lifeof the heating plate is prolonged by changing from axial symmetry into central symmetry, changing an omega-shaped centre of the heating plate into a separately split or closed annular structure, and reasonably arranging the installation of an indwelling area and a voltage position.

Description

technical field [0001] The invention relates to MOCVD equipment, in particular to a heating plate for an MOCVD reaction chamber. Background technique [0002] During the growth of semiconductor chips, the uniformity of the temperature field is highly required. Therefore, a heating plate with uniform heating and long service life plays a vital role in the production of semiconductor chips. [0003] Through retrieval, a heating sheet is disclosed in the patent name: A tungsten-coated heating sheet for MOCVD equipment and its preparation method (CN106756891B), but this heating sheet is not suitable for the semiconductor field due to the hollow structure in the center Chip growth used. [0004] At present, the structure of the heating plate used in chip growth is as follows figure 1 As shown, in the middle is a heat arc plate 1 with a shape of Ω. Two sets of arc heat plates 2 are respectively connected on both sides of the heat arc plate 1. The two sets of arc heat plates 2 ar...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/46H05B3/20
CPCC23C16/46H05B3/20
Inventor 田青林黎静
Owner 江苏实为半导体科技有限公司
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