Multi-value metering standard device and preparation method thereof

A measurement standard and standard device technology, applied in the direction of instruments, measuring devices, etc., can solve the problems of unable to provide a reliable basis, limited use of a single value standard device, etc.

Active Publication Date: 2020-04-10
NAT INST OF METROLOGY CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Based on this, it is necessary to provide a multi-value measurement standard and multi-value measurement for the problem that the traditional single-value standard device has limited use of value and cannot provide a reliable basis for multi-scenario and multi-purpose situations. Standard preparation method

Method used

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  • Multi-value metering standard device and preparation method thereof
  • Multi-value metering standard device and preparation method thereof
  • Multi-value metering standard device and preparation method thereof

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Embodiment Construction

[0036] In order to make the purpose, technical solution and advantages of the present application clearer, the present application will be further described in detail through the following embodiments and in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to explain the present application, not to limit the present application.

[0037] The serial numbers assigned to components in this document, such as "first", "second", etc., are only used to distinguish the described objects, and do not have any sequence or technical meaning. The "connection" and "connection" mentioned in this application all include direct and indirect connection (connection) unless otherwise specified. In the description of this application, it should be understood that the terms "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", The orientation or positional relationship indicated by "bottom"...

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Abstract

The invention provides a multi-value metering standard device and a preparation method thereof. By means of a first square structure (S1), a second square structure (S2), a third square structure (S3), a rectangular structure (P) and the like, the multi-value measurement standard device can be constructed through arbitrary combination. At the moment, the multi-value measurement standard device hasthe advantages of having multiple values and a wide value range, being capable of combining integrated circuit process nodes and precision measurement requirements, constructing a corresponding standard device value according to a multi- value nanostructure and the like, provides a precise measurement basis for the key size, the key line width, the characteristic nanostructure and the like of a semiconductor preparation process line, and provides a plurality of portable in-situ calibration reference values for a large precise instrument. The multi-value metering standard device overcomes thedefect that a single value of a traditional standard device can only calibrate one measuring range, and improves the reliability and consistency of the application field and value transmission.

Description

technical field [0001] The present application relates to the field of precision measuring instruments, in particular to a multi-value measurement standard and a method for preparing the multi-value measurement standard. Background technique [0002] Facing the strategic demand for the development of the national integrated circuit industry, semiconductor industry, miniaturized precision instruments, and airborne aerospace light equipment, my country is actively upgrading its semiconductor process technology and large-scale integrated circuit industry to build independent integrated circuit industry standards and precision measurement , The value transmission and traceability system is the key link in the upgrading of integrated circuits and other industries, and it is the foundation for improving and stabilizing the performance of my country's chip industry. The establishment and improvement of nano standard instruments is the value carrier and application export of industri...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B21/04
CPCG01B21/042
Inventor 朱振东谭峭峰屈继峰高思田
Owner NAT INST OF METROLOGY CHINA
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