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Exposure machine and contraposition method thereof

An exposure machine and position alignment technology, applied in the field of exposure machines, can solve the problems of long alignment time, affecting production efficiency, etc., and achieve the effects of short alignment time, increasing output and satisfying quality.

Active Publication Date: 2020-04-17
SUZHOU YUANZHUO OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The exposure machine is equipped with two sliding cameras to align the two substrates respectively. The cameras need to align the alignment points on the edge first, and then move to the alignment point on the other side of the substrate for alignment over a long distance. Long alignment time affects production efficiency

Method used

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  • Exposure machine and contraposition method thereof
  • Exposure machine and contraposition method thereof
  • Exposure machine and contraposition method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] Embodiment 1: as figure 1 As shown, multiple exposure substrates are placed on the substrate table 14 at the same time to realize fast loading and unloading. Since the exposure substrates are positioned along the multi-center scale on the substrate table 14, the positioning accuracy is guaranteed. The alignment system includes a left alignment camera 2, an alignment mechanism 3 and a right alignment camera 4, the left alignment camera 2 and the right alignment camera 4 slide along the guide rail in the X direction, the alignment mechanism 3 is fixed on the gantry, The exposure system is also installed on Gantry 1. After the board placement is completed, the left alignment camera 2 obtains the coordinates of the left alignment points of the two exposed substrates 15 and 17 on the left, and the right alignment camera 4 obtains the coordinates of the right alignment points of the two exposed substrates 16 and 18 on the right , the alignment mechanism 3 acquires the coordi...

Embodiment 2

[0046] Embodiment 2: as figure 2 As shown, multiple exposure substrates are placed on the substrate table 14 at the same time to realize fast loading and unloading. Since the exposure substrates are positioned along the multi-center scale on the substrate table 14, the positioning accuracy is guaranteed. The alignment mechanism 3' adopts such as image 3 As shown in the structure of dual cameras and dual lenses, after the board placement is completed, the left alignment camera 2 obtains the coordinates of the left alignment points of the left two exposed substrates 15 and 17, and the right alignment camera 4 obtains the coordinates of the right two exposure substrates. The coordinates of the alignment points on the right side of the exposure substrates 16 and 18, the alignment system 3' can simultaneously obtain the coordinates of the alignment points on the right side of the two exposure substrates 15 and 17 on the left and the left sides of the two exposure substrates 16 an...

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Abstract

The invention discloses an exposure machine, which comprises a base, a gantry mechanism arranged on the base, a contraposition system fixed on the gantry mechanism, a multi-axis movement mechanism arranged on the base, and a substrate platform arranged on the multi-axis movement mechanism. The contraposition mechanism comprises contraposition cameras located at the two ends and an alignment mechanism located between the contraposition cameras, the substrate platform comprises a regional vacuum chuck capable of containing at least two exposure substrates, and the alignment mechanism is responsible for contraposition of the adjacent edges of the adjacent exposure substrates. According to the exposure machine and the contraposition method thereof, contraposition exposure operation can be quickly and effectively carried out on a plurality of same or different substrates, and meanwhile, the quality of exposure patterns can be well met.

Description

Technical field: [0001] The present invention relates to the technical field of photolithography, in particular to an exposure machine and an alignment method of the exposure machine. Background technique: [0002] Photolithography is used to print a pattern of features on the surface of a substrate. Such substrates may include substrates used in the fabrication of semiconductor devices, various integrated circuits, flat panel displays (eg, liquid crystal displays), circuit boards, biochips, micromechanical electronic chips, optoelectronic circuit chips, and the like. Direct writing lithography technology plays a very important role in the field of semiconductor and PCB production by replacing the direct image transfer technology exposed by traditional masks or film negatives. [0003] In the direct writing exposure machine, two substrates are exposed at the same time in order to improve production efficiency. The exposure machine is equipped with two sliding cameras to al...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/7085G03F7/2051G03F7/70508
Inventor 刘栋张雷
Owner SUZHOU YUANZHUO OPTOELECTRONICS TECH CO LTD
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