Mechanism and method for plasma impurity injection of fusion device

A technology of impurity injection and plasma, which is applied in fusion reactors, thermonuclear fusion reactors, and reduction of greenhouse gases. Sealing performance, ease of use, and improved accuracy

Active Publication Date: 2020-04-28
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

On the one hand, it will affect the vacuum sealing performance of the plug-in valve and reduce its service life, especially with corrosive impurity particles (such as lithium powder, lithium balls, etc.); on the other hand, it will affect the accuracy of the injection amount of impurity particles (powder). Degree, especially for impurity particles with poor fluidity (such as boron powder)
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  • Mechanism and method for plasma impurity injection of fusion device
  • Mechanism and method for plasma impurity injection of fusion device

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[0039] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. The components of the embodiments of the present invention generally described and illustrated in the drawings herein may be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative work shall fall within the protection scope of the present invention.

[0040] Su...

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Abstract

The invention discloses a mechanism and method for plasma impurity injection of a fusion device. The mechanism comprises a first connecting piece, a second connecting piece, a third connecting piece,a collector, a first guide port, a second guide port, a first guide pipe, a second guide pipe, a linear importer with scales, an air exhaust pipeline, an air exhaust valve, an air exhaust unit and a gate valve. The components are cooperatively assembled, and impurity particles are accurately and efficiently injected into plasma. Falling impurity particles (powder) can be collected when impuritiesare injected into a distribution system for testing, repeated utilization is achieved, and waste is reduced; the sealing performance of the gate valve can be protected, and the service life of the gate valve is effectively prolonged; and the accuracy of the injection amount of the impurity particles (especially powder) injected into the system can be improved. The transition mechanism for impurityparticle (powder) injection is easy to operate, capable of saving energy, efficient and high in precision, and a good technical basis is provided for successful application of impurity injection in afusion reactor in the future.

Description

technical field [0001] The invention relates to the field of fusion reactor vacuum technology, in particular to a mechanism and method for injecting plasma impurities into a fusion device. Background technique [0002] Magnetic confinement controlled nuclear fusion is one of the important ways to solve human energy and environmental problems. With the deepening of fusion experiments, the use of low-Z impurity implantation to control the radiation in the plasma divertor region, suppress the boundary localized modes (ELMs) under high confinement conditions, and improve the plasma boundary recirculation have become more and more popular among researchers. Pay attention to. In order to study the effect of impurity implantation on plasma performance, it is particularly urgent to establish a reliable and stable plasma impurity implantation system (especially metal particle impurities). Traditionally, when injecting particulate impurities, the gate valve is directly used to conne...

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Application Information

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IPC IPC(8): G21B1/11
CPCG21B1/11Y02E30/10
Inventor 黄明孙震钱玉忠徐伟孟献才李成龙韦俊庄会东左桂忠胡建生
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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