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Carrying device and cleaning system of a vapor deposition reaction chamber

A reaction chamber, vapor deposition technology, applied to electrical components, cleaning hollow objects, cleaning methods and utensils, etc., can solve problems such as damage, quartz bell 2 slipping and breaking, quartz bell 2 cracking, etc., to reduce the damage rate, Improve cleaning cleanliness and avoid slippage damage

Active Publication Date: 2022-05-27
XIAN ESWIN MATERIAL TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] But the quartz bell jar 2 is a fragile part, and the top of the quartz bell jar 2 clamped by the clamping device 3 is easy to cause the quartz bell jar 2 to break due to excessive pressure or cause the quartz bell jar 2 to slip and break due to too little pressure. The holding device 3 may cause the opening end of the quartz bell jar 2 to collide with the bottom of the cleaning chamber 1 and be damaged during the descent process, increasing the damage rate of the quartz bell jar 2
In addition, the existing quartz bell jar 2 is often cleaned with mixed acid and deionized water in the same cleaning room, which cannot guarantee that the mixed acid residue inside the quartz bell jar 2 and the cleaning chamber 1 is cleaned, which may lead to insufficient cleaning of the quartz bell jar 2

Method used

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  • Carrying device and cleaning system of a vapor deposition reaction chamber
  • Carrying device and cleaning system of a vapor deposition reaction chamber
  • Carrying device and cleaning system of a vapor deposition reaction chamber

Examples

Experimental program
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Embodiment 1

[0043] See figure 2 , figure 2 It is a schematic structural diagram of a carrier device of a vapor deposition reaction chamber provided in an embodiment of the present invention. The carrier device of the vapor deposition reaction chamber can be used to support a bell-shaped chamber (such as a quartz bell jar), and can also be used to support a vapor deposition reaction chamber of other materials and shapes and having an open end. In a specific embodiment, the carrying device of the vapor deposition reaction chamber is used to carry the quartz bell during the cleaning process of the quartz bell, and is placed into the cleaning device together with the quartz bell for cleaning.

[0044] The bearing device of the vapor deposition reaction chamber includes: a bearing plate 21 , a baffle assembly 22 and a bearing member 23 .

[0045] The carrier plate 21 is mainly used to carry and fix the vapor deposition reaction chamber, and may be a rectangular plate with four sides or a c...

Embodiment 2

[0058] See Figure 4 , Figure 4 It is a schematic structural diagram of a cleaning system for a vapor deposition reaction chamber provided in an embodiment of the present invention. The cleaning system includes at least two cleaning devices 31 , a carrier device 20 and a conveying device 32 .

[0059] At least two cleaning devices 31 are arranged in parallel, and each cleaning device 31 is provided with a liquid inlet for introducing cleaning solution; Perform staged, sub-area cleaning. Taking two cleaning devices 31 as an example, one cleaning device 31 can be filled with mixed acid cleaning liquid, and the other cleaning device 31 can be filled with deionized water. During cleaning, the vapor deposition reaction chamber can be put into the mixed acid cleaning device. The inner surface is cleaned, and then put into a deionized water cleaning device to clean the inner surface and the outer surface together.

[0060] Further, see Figures 5a-5b , Figures 5a-5b It is a s...

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PUM

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Abstract

The invention relates to a carrying device and a cleaning system of a vapor deposition reaction chamber. The carrying device of the vapor deposition reaction chamber includes: a carrying plate, a baffle assembly and a supporting member, wherein a first opening is opened on the carrying plate; The baffle assembly surrounds the bearing plate in a circumferential direction, so that the baffle assembly and the bearing plate form an accommodating chamber for accommodating the vapor deposition reaction chamber; the supporting member spans both sides of the baffle assembly and is located above the bearing plate. The carrying device of the vapor deposition reaction chamber of the present invention effectively protects the vapor deposition reaction chamber, avoids the rupture of the vapor deposition reaction chamber due to excessive clamping pressure or slips and damages due to too low pressure, and at the same time lowers and releases the vapor deposition reaction chamber on the carrying device During the process of entering the cleaning chamber, the bottom of the carrier plate is in contact with the bottom of the cleaning chamber, which avoids the damage caused by direct collision between the open end of the vapor deposition reaction chamber and the bottom of the cleaning chamber, thereby reducing the damage rate of the vapor deposition reaction chamber.

Description

technical field [0001] The invention belongs to the technical field of semiconductor processing, and particularly relates to a carrier device and a cleaning system for a vapor deposition reaction chamber. Background technique [0002] In an epitaxial reactor setup, a thin film is grown on the surface of a silicon wafer by performing a vapor deposition reaction on a silicon wafer inside a process chamber consisting of a quartz bell jar. However, in the process of vapor deposition, the reactants are not only deposited on the silicon wafer surface, but also on the inner surface of the quartz bell; if the quartz bell is not cleaned for a long time, a thick layer will be formed on the inner surface of the quartz bell The film affects the light transmittance of the lamp module of the heating device and the fluidity of the reaction gas, and may generate particles on the inner surface of the quartz bell, thus affecting the growth process of the silicon wafer and reducing the yield o...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B9/30B08B9/34H01L21/20
CPCB08B9/30B08B9/34H01L21/20
Inventor 刘凯王力
Owner XIAN ESWIN MATERIAL TECH CO LTD