Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Ecological ditch-and-source-preserving restoration method for slopes in gully regions of eastern-Gansu Loess Plateau

A technology for ecological restoration and the Loess Plateau, which is applied in land preparation methods, botanical equipment and methods, and excavation.

Active Publication Date: 2020-05-12
中建生态环境集团有限公司 +1
View PDF6 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] So far, the rigid management methods such as horse trails and terraced fields have been commonly used in the gully area of ​​the Loess Plateau in the east of Longdong to protect the plateau slope, which has a low degree of integration with the ecological environment and has destroyed the original landform and ecological base of the Loess Plateau.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Ecological ditch-and-source-preserving restoration method for slopes in gully regions of eastern-Gansu Loess Plateau
  • Ecological ditch-and-source-preserving restoration method for slopes in gully regions of eastern-Gansu Loess Plateau
  • Ecological ditch-and-source-preserving restoration method for slopes in gully regions of eastern-Gansu Loess Plateau

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0048] Invented an ecological restoration method for gully-protected plateau slopes in the gully area of ​​the Loess Plateau in eastern Longdong. Combined with topographic maps, the slope landform, erosion degree, and groundwater distribution were analyzed to match the corresponding slope types. Under the principle of less cutting, no cutting, and keeping the original topography and geomorphology as much as possible, analyze the development of unfavorable geological phenomena such as landslides, unstable slopes, collapses (slides) collapses, and sinkholes on both sides of the ditch to achieve point-to-point precise ecological restoration and Comprehensive management.

[0049] The types of slopes include: (1) large slopes with large areas of cut and fill; (2) large slopes that are developing and surrounding conditions do not allow large areas of cut and fill; (3) Small slopes with high risk of landslides; (4) small slopes with tension cracks at the trailing edge of the slope; (...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to an ecological ditch-and-source-preserving restoration method for slopes in gully regions of eastern-Gansu Loess Plateau. The method is used for carrying out analysis of the landform, erosion degree and groundwater distribution of the slopes in combination with a topographic map in order to match corresponding slope types. The slope types include (1) large slopes with large cutting and filling areas; (2) large slopes that are in a development period and with surrounding conditions not allowing large-area cutting and filling works; (3) sections with small landslides with a relatively great sliding risk, good overall stability and with landslides and less-stable slope local soil bodies having wedge sliding hazards; (4) small slopes with stretch-draw cracks at back edges; (5) small slopes or unstable blocks not allowing cutting and filling works; and (6) sections having construction and structures needing to be protected. According to the invention, on the basis of maximized protection of the original topography, landform and ecological substrate of the Loess Plateau, point-to-point and precise restoration of the gully regions of different topography and landforms in eastern-Gansu Loess Plateau is realized.

Description

technical field [0001] The invention relates to the technical field of ecological environment restoration, in particular to a method for ecological restoration of gullies and grassland protection slopes in the gully area of ​​the Loess Plateau in eastern Longdong. Background technique [0002] Longdong area is located in the central part of my country's Loess Plateau, and is one of the typical regions for the development of loess landforms in my country. This area is characterized by alternating plateaus and gullies, vertical and horizontal gullies, sparse vegetation, and loose soil. Soil erosion is serious. With the disturbance of human activities such as urban expansion, infrastructure construction, and oil and coal resource development, water and soil erosion in gully areas has intensified, gully heads continue to extend, plateau surfaces shrink year by year, and natural disasters such as landslides, landslides, and collapses often occur. It is imperative to protect the g...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): E02D17/20E02B11/00A01B79/02A01G20/00A01G17/00
CPCA01B79/02A01G17/005A01G20/00E02B11/00E02D17/20E02D17/202
Inventor 安东子孙金顺张云富谭国霞范洁田振国高奎王宴强
Owner 中建生态环境集团有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products