Industrial CT defect detection method based on deep learning

A defect detection and deep learning technology, applied in image data processing, instruments, computing, etc., can solve the problems of increased production cost, time-consuming, poor model accuracy, etc., to reduce production costs and improve production efficiency.

Pending Publication Date: 2020-05-19
CITIC HEAVY INDUSTRIES CO LTD +1
View PDF3 Cites 29 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In the current field of industrial defect detection, most still use the method of visually observing the defect to determine the defect area and manually mark it. This method cannot determine the precise defect area and consumes a lot of time; another method is to use traditional image processing. Technologies, such as SIFT+SVM, cluster the extracted image features and then classify them, and in recent years, VGG or DenseNet classification models based on deep convolutional neural networks, and instance segmentation models based on Mask RCNN, etc., but this classification method is aimed at When the foreground and background of defects are unbalanced or the types of defects are unbalanced, the accuracy of the model is not good, which leads to the low accuracy of defect area detection in actual production and increases the production cost

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Industrial CT defect detection method based on deep learning
  • Industrial CT defect detection method based on deep learning
  • Industrial CT defect detection method based on deep learning

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Such as Figure 1-6 As shown, an industrial CT defect detection method based on deep learning, which includes the following steps:

[0031] Step 1. Collecting data: First, collect 3D images of equipment parts through industrial CT, and select 2D images with or without defects after slices as model data;

[0032] Step 2. Divide the data set: Divide the data obtained in step 1 into three parts: training set, verification set, and test set according to a certain proportion. At the same time, the data set is shuffled so that each part contains the same proportion of defective images. The data is used as the basic data for model training, the verification set is used to test the model and fine-tuned, and the test set is used as the final verification standard of the model;

[0033] Step 3. Image labeling: mark the training set and verification set images in step 2, and obtain the masks corresponding to four types of defects: holes, impurities, slag holes, and pinholes;

[...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to an industrial CT defect detection method based on deep learning. The method comprises the following steps: collecting data; dividing a data set; labeling the image; performingimage enhancement; constructing a model; customizing a loss function and an evaluation standard; training a model: training the model and storing the best weight of the trained model; post-processing: inputting the verification set picture into the model to obtain an original defect mask corresponding to the verification set original image, and performing subsequent processing on the mask; calculating the area of a defect region: calculating the area of a defect pixel through the obtained mask image containing the defect; defect segmentation: loading the weight stored in the training model asa prediction model, inputting the model to obtain an original mask image of which the original image contains various defects, and performing post-processing and defect region area calculation on themask image to obtain a final defect-containing mask image and a defect area; according to the invention, the defect area can be accurately and rapidly detected and identified in actual production.

Description

technical field [0001] The invention belongs to the field of artificial intelligence, and in particular relates to an industrial CT defect detection method based on deep learning. Background technique [0002] In the current field of industrial defect detection, most still use the method of visually observing the defect to determine the defect area and manually mark it. This method cannot determine the precise defect area and consumes a lot of time; another method is to use traditional image processing. Technologies, such as SIFT+SVM, cluster the extracted image features and then classify them, and in recent years, VGG or DenseNet classification models based on deep convolutional neural networks, and instance segmentation models based on Mask RCNN, etc., but this classification method is aimed at When the foreground and background of defects are unbalanced or the types of defects are unbalanced, the accuracy of the model is not good, which leads to the low accuracy of defect...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G06T7/00G06T7/11G06T7/62G06T3/60
CPCG06T7/0008G06T7/11G06T7/62G06T3/60G06T2207/10081G06T2207/20081G06T2207/20084G06T2207/30108
Inventor 丁博文郝兵王新昌吕益良王涛吴彦举张宏星丁卫良
Owner CITIC HEAVY INDUSTRIES CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products