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Ultraviolet surface cleaning machine

A surface cleaning and ultraviolet light technology, which is applied in cleaning methods and appliances, electrical components, semiconductor/solid-state device manufacturing, etc., can solve the problems of reduced illumination and affecting cleaning speed, etc., to achieve enhanced oxidation, improved cleaning efficiency, and reasonable design Effect

Inactive Publication Date: 2003-06-18
北京航天高力通科技发展有限公司
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Problems solved by technology

On the contrary, if the amount of ozone is too much, a large amount of ultraviolet light is absorbed by ozone, producing a large amount of atomic oxygen, and finally the ultraviolet light intensity irradiated on the surface of the cleaned substrate is reduced, so that the organic compounds on the surface cannot be fully decomposed and participate in oxidation, and the result is the same also affects the cleaning rate

Method used

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Embodiment Construction

[0019]The ultraviolet surface cleaning machine of the present invention is mainly composed of an ultraviolet light source system, a transmission system, an exhaust system, a safety protection and fault display system, and an electrical control and power supply system. In this embodiment, the whole machine is divided into two parts: the working room 1 and the electrical control and power supply room 14 . As can be seen from Fig. 1, Fig. 2 and Fig. 3, a group of high-intensity ultraviolet light with specific wavelengths of 185nm and 254nm arranged in parallel with the transport direction of the substrate 4 to be cleaned is installed in the working chamber 1 above the substrate 4 to be cleaned. The lamp tube forms an ultraviolet light surface light source 3 with a moderate size. Through scientific calculations, the distance between the light source lamp tubes is preferably 5-10 mm, and the distance between the lamp tubes and the substrate 4 to be cleaned is 10-20 mm, so as to ens...

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Abstract

The UV surface-cleaning machine is mainly formed of UV light source system, transmission system, exhaust system, safe protection and failure display system, electric control and power supply system. It features reasonable design, simple structure, simple and convenient operation, safe and reliable and good cleaning effect, and its cleaning rate is 2-3 pieces / min. Said machine can be extensively used for cleaning semiconductor device, integrated circuit and liquid crystal display device and printed circuit board, etc. in their production.

Description

1. Technical field: [0001] The invention relates to a surface cleaning machine, especially the use of ultraviolet light to remove organic matter adhered to the surface of substrates (semiconductors and semiconductor devices, integrated circuits, liquid crystal display devices, quartz resonators, surface acoustic wave devices, printed circuit boards, etc.) UV light surface cleaning machine. 2. Background technology: [0002] Ultraviolet light surface cleaning technology is a non-contact high-cleanliness dry surface cleaning treatment technology developed in the late 1980s in the world. It uses photons to photosensitive and oxidize organic compounds to remove organic substances adhering to the substrate surface. Purpose. The cleaning principle is: when organic compounds (hydrocarbons) absorb the energy of ultraviolet photons, they are decomposed into ions, free atoms, excited molecules or neutral molecules, which is the so-called photosensitive process of organic matter. Oxy...

Claims

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Application Information

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IPC IPC(8): B08B7/00H01L21/30H01L21/3065
Inventor 谈凯声周森郭恩荣周风徐盘祥
Owner 北京航天高力通科技发展有限公司
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