Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Scanning nozzle cleaning tank and scanning nozzle cleaning method

A technology for cleaning tanks and nozzles, applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., can solve problems such as difficulty in tank detection, inability to complete normal overflow or fast discharge, etc., to reach the tank body Reasonable layout, compact structure, and the effect of increasing production capacity

Active Publication Date: 2020-06-26
JIANGSU LEUVEN INSTR CO LTD
View PDF8 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, fluorine-containing plastics are hydrophobic. If they encounter a liquid with a slightly higher surface tension, such as a water-based solution, it will not be able to complete normal overflow or fast drainage in a small tank.
In addition, generally fluorine-containing plastics are non-transparent, and it is difficult to detect the liquid level of the tank

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Scanning nozzle cleaning tank and scanning nozzle cleaning method
  • Scanning nozzle cleaning tank and scanning nozzle cleaning method
  • Scanning nozzle cleaning tank and scanning nozzle cleaning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] In order to make the purpose, technical solutions and advantages of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. It should be understood that the specific The examples are only used to explain the present invention, not to limit the present invention. The described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0020] In the description of the present invention, it should be noted that the orientation or positional relationship indicated by the terms "upper", "lower", "vertical" and "horizontal" are based on the orientation or positional relation...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a scanning nozzle cleaning tank and a scanning nozzle cleaning method. The scanning nozzle cleaning tank comprises a tank body and an upper cover plate, wherein the tank body and the upper cover plate are sealed by a corrosion-resistant sealing ring; the tank body is provided with at least four reagent storage tanks; the upper cover plate is correspondingly provided with nozzle inlets and outlets of the same number as the reagent storage tanks; each reagent storage tank is provided with a liquid inlet, an overflow port and a liquid level sensor; the bottom of each reagent storage tank is provided with a liquid discharge port; and each liquid level sensor is used for detecting whether the liquid level of a reagent in the corresponding reagent storage tank is in an empty state or a full state. The tank body layout is more reasonable, the structure is more compact, the use cost is lower, pollution can be effectively reduced, and a reasonable use method is providedto improve productivity.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a scanning nozzle cleaning tank and a cleaning method. Background technique [0002] Driven by Moore's Law, the 14nm generation of high-performance, low-power devices dominated by FinFETs (Fin Field Effect Transistors) has already entered our lives, but few people know that a large number of new chemicals need to be introduced to manufacture such powerful devices. Elements, fewer people know that because the introduction of "new" elements has made it extremely difficult to monitor the pollution of chip processing plants. Because each element has different effects on silicon-based devices, some must be added to achieve functions, and some are unintentionally introduced to reduce or kill the pollution source of the device, so all possible elements must be strictly monitored. In the periodic table of elements, metal elements account for the majority, and their active chemica...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/08B08B3/02B08B13/00
CPCB08B3/02B08B3/08B08B13/00
Inventor 邹志文侯永刚朱磊徐康宁崔虎山胡冬冬陈璐许开东
Owner JIANGSU LEUVEN INSTR CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products